Analysis of Ultratrace Impurities in High Purity Copper using the Agilent 8900 ICP-QQQ
Applications | 2018 | Agilent TechnologiesInstrumentation
ICP/MS, ICP/MS/MS
IndustriesEnergy & Chemicals , Semiconductor Analysis
ManufacturerAgilent Technologies
Key wordsmass, shift, ultratrace, arcu, elements, interferences, alkali, arar, copper, purity, ppt, metals, omega, lens, standards, icp, layers, deposition, impurities, differences, cuhhh, matrix, high, using, background, vapor, arnh, cuno, cuoo, mooo, nboo, taoo, woo, bias, arh, uoo, istd, tuning, cvd, cell, measured, zro, hfo, sub, signals, tho, aro, eies, element, arcl
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