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Ultra trace measurement of potassium and other elements in ultrapure water using the Agilent 8800 ICP-QQQ in cool plasma reaction cell mode
Applications
| 2014 | Agilent Technologies
ICP/MS, ICP/MS/MS
Instrumentation
ICP/MS, ICP/MS/MS
Manufacturer
Agilent Technologies
Industries
Semiconductor Analysis
Ultrapure Process Chemicals Analysis by ICP-QQQ with Hot Plasma Conditions
Applications
| 2021 | Agilent Technologies
ICP/MS, ICP/MS/MS
Instrumentation
ICP/MS, ICP/MS/MS
Manufacturer
Agilent Technologies
Industries
Semiconductor Analysis
WCPS: Determination of ultra-trace level impurities in high-purity metal samples by ICP-QQQ
Posters
| 2017 | Agilent Technologies
ICP/MS, ICP/MS/MS
Instrumentation
ICP/MS, ICP/MS/MS
Manufacturer
Agilent Technologies
Industries
Materials Testing
Agilent ICP-MS Journal (August 2021, Issue 85)
Others
| 2021 | Agilent Technologies
Consumables, ICP/MS, ICP/MS/MS
Instrumentation
Consumables, ICP/MS, ICP/MS/MS
Manufacturer
Agilent Technologies
Industries
Environmental, Food & Agriculture
Analysis of Ultratrace Impurities in High Purity Copper using the Agilent 8900 ICP-QQQ
Applications
| 2018 | Agilent Technologies
ICP/MS, ICP/MS/MS
Instrumentation
ICP/MS, ICP/MS/MS
Manufacturer
Agilent Technologies
Industries
Energy & Chemicals , Semiconductor Analysis
Characterization of Trace Impurities in Silicon Wafers by High Sensitivity Reaction Cell ICP-MS
Applications
| 2003 | Agilent Technologies
ICP/MS
Instrumentation
ICP/MS
Manufacturer
Agilent Technologies
Industries
Semiconductor Analysis
Direct Analysis of Photoresist and Related Solvents Using the Agilent 7500cs ICP-MS
Applications
| 2004 | Agilent Technologies
ICP/MS
Instrumentation
ICP/MS
Manufacturer
Agilent Technologies
Industries
Semiconductor Analysis
Determination of Trace Metal Impurities in Semiconductor Grade Phosphoric Acid by High Sensitivity Reaction Cell ICP-MS
Applications
| 2003 | Agilent Technologies
ICP/MS
Instrumentation
ICP/MS
Manufacturer
Agilent Technologies
Industries
Semiconductor Analysis
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LabRulez s.r.o. All rights reserved. Content available under a CC BY-SA 4.0 Attribution-ShareAlike