Ultrapure Process Chemicals Analysis by ICP-QQQ with Hot Plasma Conditions
Aplikace | 2021 | Agilent TechnologiesInstrumentation
ICP/MS, ICP/MS/MS
IndustriesPolovodiče
ManufacturerAgilent Technologies
Key wordssemiconductor, ppt, becs, dls, elements, icp, ultratrace, bec, plasma, eie, contaminants, astm, upw, backgrounds, semi, gas, cell, interferences, skimmer, reaction, qqq, control, hot, cone, were, mode, ultrapure, multitune, shimamura, yoshinori, using, measured, lens, replicates, international, kazuhiro, modes, matrix, mass, ensures, single, sakai, publish, industry, standards, purity, chemicals, remove, fabrication, suppresses
Similar PDF
Measuring Inorganic Impurities in Semiconductor Manufacturing
2022|Agilent Technologies|Guides
Applications of ICP-MS Measuring Inorganic Impurities in Semiconductor Manufacturing Application Compendium > Return to table of contents > Search entire document Table of contents ICP-MS and ICP-QQQ in the Semiconductor Industry 4 Agilent Has Three Decades of ICP-MS Experience Driving…
Key words
return, returncontents, contentstable, tableicp, icpcps, cpsppt, pptgas, gassemiconductor, semiconductorconc, concqqq, qqqbec, becdocument, documententire, entiresearch, searchmode
Agilent ICP-MS Journal (August 2021, Issue 85)
2021|Agilent Technologies|Others
Agilent ICP-MS Journal August 2021, Issue 85 Optimizing ICP-MS Methods and Performance Page 1 Optimizing ICP-MS Methods and Performance Pages 2-3 Analysis of Impurities in Ultrapure Water Using Agilent 8900 ICP-QQQ with Hot Plasma and m-Lens Pages 4-5 Space Charge…
Key words
icp, icpnewsletter, newsletterplasma, plasmaacademia, academiacool, coolagilent, agilentions, ionsspace, spaceinsights, insightsbackgrounds, backgroundselement, elementordering, orderingbeam, beamtubing, tubingcharge
Determination of Ultratrace Impurities in Semiconductor Photoresist Using ICP-MS/MS
2023|Agilent Technologies|Aplikace
Application Note Semiconductor Determination of Ultratrace Impurities in Semiconductor Photoresist Using ICP-MS/MS Monitoring 20 elemental contaminants in IC photoresist by Agilent 8900 ICP-QQQ after simple dilution in PGMEA solvent Authors Introduction Yu Ying, Xiangcheng Zeng, Juane Song With the rapid…
Key words
bec, becpgmea, pgmeasemiconductor, semiconductorelement, elementphotoresist, photoresistdls, dlsplasma, plasmacontroller, controllerimpurities, impuritiesicp, icpcalibration, calibrationbecs, becselements, elementsultratrace, ultratracegas
Automated Analysis of Semiconductor Grade Hydrogen Peroxide and DI Water using ICP-QQQ
2018|Agilent Technologies|Aplikace
Application Note Semiconductor Automated Analysis of Semiconductor Grade Hydrogen Peroxide and DI Water using ICP-QQQ Online MSA calibration using prepFAST S automated sample introduction and Agilent 8900 ICP-QQQ Authors Kazuhiro Sakai Agilent Technologies, Japan Austin Schultz Elemental Scientific, USA Introduction…
Key words
gas, gasprepfast, prepfastcool, coolsemiconductor, semiconductoricp, icpelements, elementsbec, becmsa, msaautomated, automatedqqq, qqqconc, concultratrace, ultratraceupw, upwsample, sampletune