Ultrapure Process Chemicals Analysis by ICP-QQQ with Hot Plasma Conditions

Applications | 2021 | Agilent TechnologiesInstrumentation
Semiconductor Analysis
Agilent Technologies
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Agilent ICP-MS Journal (August 2021, Issue 85)
2021|Agilent Technologies|Others
Agilent ICP-MS JournalAugust 2021, Issue 85Optimizing ICP-MS Methodsand PerformancePage 1Optimizing ICP-MS Methodsand PerformancePages 2-3Analysis of Impurities inUltrapure Water Using Agilent8900 ICP-QQQ with HotPlasma and m-LensPages 4-5Space Charge in ICP-MS. WhatCauses It and What Does ItMean for Your Analysis?Page 6This issue...
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Application NoteSemiconductorAutomated Analysis of SemiconductorGrade Hydrogen Peroxide and DI Waterusing ICP-QQQOnline MSA calibration using prepFAST S automatedsample introduction and Agilent 8900 ICP-QQQAuthorsKazuhiro SakaiAgilent Technologies, JapanAustin SchultzElemental Scientific, USAIntroductionMaximizing product yield and performance of semiconductor devices requiresmanufacturers to address the potential...
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Application NoteSemiconductorDetermination of Ultratrace Impuritiesin Semiconductor Photoresist UsingICP-MS/MSMonitoring 20 elemental contaminants in ICphotoresist by Agilent 8900 ICP-QQQ after simpledilution in PGMEA solventAuthorsIntroductionYu Ying, Xiangcheng Zeng,Juane SongWith the rapid development of the consumer electronics industry and the expandinguse of computer chips...
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