Sub-ppb detection limits for hydride gas contaminants using GC-ICP-QQQ
Applications | 2015 | Agilent TechnologiesInstrumentation
GC, Speciation analysis, ICP/MS/MS
IndustriesEnergy & Chemicals , Semiconductor Analysis
ManufacturerAgilent Technologies
Key wordssulfide, icp, ppb, qqq, carbonyl, gas, cell, phosphine, silane, omega, cos, hydride, using, semiconductor, low, exit, petrochemical, level, scanlon, anticipation, calibration, geiger, were, supplied, oxygen, transistors, value, diluter, integration, standard, production, hydrogen, industry, mass, contaminants, purity, measuring, demanded, multipoint, william, backgrounds, based, deleterious, reaction, either, performance, background, qms, used, dynamically
Similar PDF
Determination of Trace Impurities in Electronic Grade Arsine by GC-ICP-QQQ
2020|Agilent Technologies|Applications
Application NoteSemiconductorDetermination of Trace Impuritiesin Electronic Grade Arsine byGC-ICP-QQQSub-ppb detection limits for hydride gascontaminants using a single column, single injectionvolume, and multi-tune methodAuthorsIntroductionWilliam M. Geiger, BlakeMcElmurry, Jesus Anguiano1Mark Kelinske2Most electronic devices use silicon-based semiconductors. However certainapplications can benefit from alternative...
Key words
germane, germanearsine, arsinephosphine, phosphinesilane, silaneicp, icpsulfide, sulfidehydrogen, hydrogengas, gasintegration, integrationhydride, hydridedopants, dopantsgallium, galliumtime, timeqqq, qqqstandard
ANALYSIS OF PROPYLENE IMPURITIES USING SELECT LOW SULFUR COLUMN AND SINGLE TUNE WITH GC-ICP-MS QQQ ORS
2016|Agilent Technologies|Others
CHEMICAL & ENERGY ANALYSISANALYSIS OF PROPYLENE IMPURITIES USINGSELECT LOW SULFUR COLUMN AND SINGLE TUNEWITH GC-ICP-MS QQQ ORSSolutions for Your Analytical BusinessMarkets and Applications ProgramsAuthorWilliam M. GeigerBlake McElmurryJesus AnguianoCONSCI, Ltd. Pasadena, Texas, USAAbstractThere are a number of impurities that are of...
Key words
propylene, propylenesulfide, sulfidearsine, arsinephosphine, phosphinesulfur, sulfurtune, tunemarkets, marketscarbonyl, carbonylanalyte, analyteselect, selectpropane, propanematrix, matrixmcelmurry, mcelmurrysingle, singleblake
Measuring Inorganic Impurities in Semiconductor Manufacturing
2022|Agilent Technologies|Guides
Applications of ICP-MSMeasuring Inorganic Impuritiesin Semiconductor ManufacturingApplication Compendium> Return to table of contents> Search entire documentTable of contentsICP-MS and ICP-QQQ in the Semiconductor Industry4Agilent Has Three Decades of ICP-MS Experience DrivingContinuous Innovation7Agilent ICP-MS Solutions for the Semiconductor Industry8Automating Analysis of...
Key words
return, returncontents, contentsicp, icptable, tablecps, cpsppt, pptgas, gassemiconductor, semiconductorconc, concqqq, qqqbec, becdocument, documententire, entiresearch, searchmode
Agilent ICP-MS Journal (July/August 2015 – Issue 62)
2015|Agilent Technologies|Others
Agilent ICP-MS JournalJuly/August 2015 – Issue 62Inside this Issue2-3New! Solution-ready Agilent 7800 ICP-MS4-5Sub-ppb Detection Limits for Hydride Gas Contaminantsusing GC-ICP-QQQ6Agilent MAPs: Innovative New Services BenefitCustomers in EMEAI7Software Tips and Tricks: Migrating to ICP-MSMassHunter 4.2 – Why You Should Consider Makingthe...
Key words
icp, icpmaps, mapsagilent, agilentpolyatomic, polyatomicphosphine, phosphinecustomers, customershydride, hydridenew, newnanoparticle, nanoparticleqqq, qqqemeai, emeaimatrix, matrixmany, manylimits, limitsanalysis