Sub-ppb detection limits for hydride gas contaminants using GC-ICP-QQQ
Applications | 2015 | Agilent TechnologiesInstrumentation
GC, Speciation analysis, ICP/MS/MS
IndustriesEnergy & Chemicals , Semiconductor Analysis
ManufacturerAgilent Technologies
Key wordssulfide, icp, ppb, qqq, carbonyl, gas, cell, phosphine, silane, omega, cos, hydride, using, semiconductor, low, exit, petrochemical, level, scanlon, anticipation, calibration, geiger, were, supplied, oxygen, transistors, value, diluter, integration, standard, production, hydrogen, industry, mass, contaminants, purity, measuring, demanded, multipoint, william, backgrounds, based, deleterious, reaction, either, performance, background, qms, used, dynamically
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germane, germanearsine, arsinephosphine, phosphinesilane, silaneicp, icpsulfide, sulfidehydrogen, hydrogengas, gasintegration, integrationhydride, hydridedopants, dopantsgallium, galliumtime, timeqqq, qqqstandard
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propylene, propylenesulfide, sulfidearsine, arsinephosphine, phosphinesulfur, sulfurtune, tunemarkets, marketscarbonyl, carbonylanalyte, analyteselect, selectpropane, propanematrix, matrixmcelmurry, mcelmurrysingle, singleblake
Measuring Inorganic Impurities in Semiconductor Manufacturing
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Applications of ICP-MSMeasuring Inorganic Impuritiesin Semiconductor ManufacturingApplication Compendium > Return to table of contents> Search entire documentTable of contentsICP-MS and ICP-QQQ in the Semiconductor Industry4Agilent Has Three Decades of ICP-MS Experience DrivingContinuous Innovation7Agilent ICP-MS Solutions for the Semiconductor Industry8Automating Analysis of...
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Agilent ICP-MS Journal (July/August 2015 – Issue 62)
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Agilent ICP-MS JournalJuly/August 2015 – Issue 62Inside this Issue2-3New! Solution-ready Agilent 7800 ICP-MS4-5Sub-ppb Detection Limits for Hydride Gas Contaminantsusing GC-ICP-QQQ6Agilent MAPs: Innovative New Services BenefitCustomers in EMEAI7Software Tips and Tricks: Migrating to ICP-MSMassHunter 4.2 – Why You Should Consider Makingthe...
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