Sub-ppb detection limits for hydride gas contaminants using GC-ICP-QQQApplications | 2015 | Agilent Technologies InstrumentationGC, Speciation analysis, ICP/MS/MSIndustriesEnergy & Chemicals , Semiconductor Analysis ManufacturerAgilent TechnologiesKey wordsicp, sulfide, ppb, qqq, carbonyl, cell, gas, phosphine, omega, silane, hydride, cos, semiconductor, using, low, exit, petrochemical, level, scanlon, anticipation, calibration, geiger, supplied, were, transistors, oxygen, value, integration, diluter, standard, production, purity, industry, hydrogen, measuring, contaminants, mass, backgrounds, demanded, background, multipoint, dls, ked, based, william, reaction, qms, deleterious, either, performance
Similar PDF
Determination of Trace Impurities in Electronic Grade Arsine by GC-ICP-QQQ
2020|Agilent Technologies|Applications
Application NoteSemiconductorDetermination of Trace Impuritiesin Electronic Grade Arsine byGC-ICP-QQQSub-ppb detection limits for hydride gascontaminants using a single column, single injectionvolume, and multi-tune methodAuthorsIntroductionWilliam M. Geiger, BlakeMcElmurry, Jesus Anguiano1Mark Kelinske2Most electronic devices use silicon-based semiconductors. However certainapplications can benefit from alternative...
Key words
germane, germanearsine, arsinephosphine, phosphinesilane, silaneicp, icpsulfide, sulfidehydrogen, hydrogengas, gashydride, hydrideintegration, integrationgallium, galliumdopants, dopantsqqq, qqqtime, timedls
5th EditionHandbook of ICP-QQQApplications using theAgilent 8800 and 8900Primer > Return to table of contents> Search entire documentForewordAgilent Technologies launched its 8800 Triple QuadrupoleICP-MS (ICP-QQQ) at the 2012 Winter Conference on PlasmaSpectrochemistry in Tucson, Arizona, USA.By the time the first ICP-QQQ...
Key words
return, returnicp, icpcontents, contentstable, tableqqq, qqqcps, cpsgas, gasdocument, documentmass, masscell, cellppt, pptconc, concelements, elementsentire, entireelement
Agilent ICP-MS JournalOctober 2020, Issue 82Agilent ICP-MS Methods for aRange of ContaminantsPage 1Agilent ICP-MS Methods for aRange of ContaminantsPages 2-3GC-ICP-QQQ Method toMeasure Trace Contaminantsin Arsine Gas Used for III-VCompound SemiconductorsPages 4-5HPLC-ICP-MS Supports NewlyApproved US FDA Limit forInorganic Arsenic in All...
Key words
icp, icpsemiconductor, semiconductorqqq, qqqias, iaswebinar, webinaragilent, agilentrice, ricearsenic, arseniciii, iiisemiconductors, semiconductorslive, livefda, fdainorganic, inorganicarticles, articlesarsine
Agilent 8900 Triple Quadrupole ICP-MSTechnical OverviewIntroductionAgilent is the worldwide market leader in quadrupole ICP-MS, and the onlysupplier of triple quadrupole ICP-MS (ICP-QQQ).Introduced in 2012, ICP‑QQQ has transformed interference removal inICP‑MS, using MS/MS to control reaction chemistry and deliver consistent,reliable results...
Key words
icp, icpqqq, qqqsensitivity, sensitivityacceleration, accelerationdls, dlsions, ionscell, cellsemiconductor, semiconductorreaction, reactionaxial, axialapplications, applicationsquadrupole, quadrupolesignal, signalnps, npshigh