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Determination of Trace Impurities in Electronic Grade Arsine by GC-ICP-QQQ

Applications | 2020 | Agilent TechnologiesInstrumentation
GC, ICP/MS, Speciation analysis, ICP/MS/MS
Industries
Semiconductor Analysis
Manufacturer
Agilent Technologies
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Sub-ppb detection limits for hydride gas contaminants using GC-ICP-QQQ Application note Semiconductor and petrochemical Authors William Geiger CONSCI, Ltd., Pasadena, Texas, USA Emmett Soffey, Steve Wilbur and Chris Scanlon Agilent Technologies Inc., USA Introduction Hydride gases, such as phosphine and…
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Agilent ICP-MS Journal (October 2020, Issue 82)
2020|Agilent Technologies|Others
Agilent ICP-MS Journal October 2020, Issue 82 Agilent ICP-MS Methods for a Range of Contaminants Page 1 Agilent ICP-MS Methods for a Range of Contaminants Pages 2-3 GC-ICP-QQQ Method to Measure Trace Contaminants in Arsine Gas Used for III-V Compound…
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Applications of ICP-MS Measuring Inorganic Impurities in Semiconductor Manufacturing Application Compendium > Return to table of contents > Search entire document Table of contents ICP-MS and ICP-QQQ in the Semiconductor Industry 4 Agilent Has Three Decades of ICP-MS Experience Driving…
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Agilent ICP-MS Journal July/August 2015 – Issue 62 Inside this Issue 2-3 New! Solution-ready Agilent 7800 ICP-MS 4-5 Sub-ppb Detection Limits for Hydride Gas Contaminants using GC-ICP-QQQ 6 Agilent MAPs: Innovative New Services Benefit Customers in EMEAI 7 Software Tips…
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