Determination of Trace Impurities in Electronic Grade Arsine by GC-ICP-QQQApplications | 2020 | Agilent Technologies InstrumentationGC, ICP/MS, Speciation analysis, ICP/MS/MSIndustriesSemiconductor Analysis ManufacturerAgilent TechnologiesKey wordsgermane, arsine, phosphine, silane, icp, sulfide, hydrogen, gas, hydride, integration, gallium, dopants, qqq, time, dls, standard, cell, semiconductor, area, kinetic, interferences, analyte, epilayers, argon, used, best, discrimination, arsenide, limits, mass, entrainment, tune, using, iii, appeal, multiplication, modes, compounds, acquisition, removal, single, dopant, purity, impurities, dilution, measure, contaminants, noise, ked, deliberately
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5th EditionHandbook of ICP-QQQApplications using theAgilent 8800 and 8900Primer > Return to table of contents> Search entire documentForewordAgilent Technologies launched its 8800 Triple QuadrupoleICP-MS (ICP-QQQ) at the 2012 Winter Conference on PlasmaSpectrochemistry in Tucson, Arizona, USA.By the time the first ICP-QQQ...
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Sub-ppb detection limits for hydride gas contaminants using GC-ICP-QQQ
2015|Agilent Technologies|Applications
Sub-ppb detection limits for hydride gascontaminants using GC-ICP-QQQApplication noteSemiconductor and petrochemicalAuthorsWilliam GeigerCONSCI, Ltd., Pasadena, Texas, USAEmmett Soffey, Steve Wilbur andChris ScanlonAgilent Technologies Inc., USAIntroductionHydride gases, such as phosphine and arsine, are important contaminantsin process chemicals used in both the petrochemical...
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Application NoteSemiconductorElemental and Particle Analysis ofN-Methyl-2-Pyrrolidone (NMP) byICP-MS/MSAnalysis of dissolved and particulate inorganicimpurities in two grades of NMP using the Agilent8900 ICP-QQQAuthorIntroductionYoshinori ShimamuraIdeally, analytical quality control (QC) testing procedures should keep pace with thetechnologies they support. This has long been...
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Agilent ICP-MS JournalOctober 2020, Issue 82Agilent ICP-MS Methods for aRange of ContaminantsPage 1Agilent ICP-MS Methods for aRange of ContaminantsPages 2-3GC-ICP-QQQ Method toMeasure Trace Contaminantsin Arsine Gas Used for III-VCompound SemiconductorsPages 4-5HPLC-ICP-MS Supports NewlyApproved US FDA Limit forInorganic Arsenic in All...
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