ANALYSIS OF PROPYLENE IMPURITIES USING SELECT LOW SULFUR COLUMN AND SINGLE TUNE WITH GC-ICP-MS QQQ ORS
Ostatní | 2016 | Agilent TechnologiesInstrumentation
GC, ICP/MS, Speciační analýza, ICP/MS/MS
IndustriesPrůmysl a chemie
ManufacturerAgilent Technologies
Key wordspropylene, sulfide, arsine, phosphine, sulfur, tune, markets, carbonyl, propane, select, analyte, matrix, mcelmurry, blake, single, programs, business, anguiano, jesus, germane, properly, determine, displaces, hydrogen, contaminants, interferences, prevent, impurities, satisfies, column, low, solves, temporarily, energy, consequence, ors, limits, carrier, acetylene, ethane, applications, your, kinetic, solutions, otherwise, qqq, isobaric, discrimination, induced, minimizing
Similar PDF
Sub-ppb detection limits for hydride gas contaminants using GC-ICP-QQQ
2015|Agilent Technologies|Applications
Sub-ppb detection limits for hydride gas contaminants using GC-ICP-QQQ Application note Semiconductor and petrochemical Authors William Geiger CONSCI, Ltd., Pasadena, Texas, USA Emmett Soffey, Steve Wilbur and Chris Scanlon Agilent Technologies Inc., USA Introduction Hydride gases, such as phosphine and…
Key words
sulfide, sulfideicp, icpppb, ppbqqq, qqqgas, gascarbonyl, carbonylcell, cellphosphine, phosphinesilane, silaneomega, omegacos, coshydride, hydrideusing, usingsemiconductor, semiconductorlow
Determination of Trace Impurities in Electronic Grade Arsine by GC-ICP-QQQ
2020|Agilent Technologies|Applications
Application Note Semiconductor Determination of Trace Impurities in Electronic Grade Arsine by GC-ICP-QQQ Sub-ppb detection limits for hydride gas contaminants using a single column, single injection volume, and multi-tune method Authors Introduction William M. Geiger, Blake McElmurry, Jesus Anguiano1 Mark…
Key words
germane, germanearsine, arsinephosphine, phosphinesilane, silanesulfide, sulfideicp, icphydrogen, hydrogengas, gasintegration, integrationhydride, hydridedopants, dopantsqqq, qqqtime, timegallium, galliumstandard
Agilent ICP-MS Journal (July/August 2015 – Issue 62)
2015|Agilent Technologies|Ostatní
Agilent ICP-MS Journal July/August 2015 – Issue 62 Inside this Issue 2-3 New! Solution-ready Agilent 7800 ICP-MS 4-5 Sub-ppb Detection Limits for Hydride Gas Contaminants using GC-ICP-QQQ 6 Agilent MAPs: Innovative New Services Benefit Customers in EMEAI 7 Software Tips…
Key words
icp, icpmaps, mapsagilent, agilentpolyatomic, polyatomicphosphine, phosphinecustomers, customershydride, hydrideqqq, qqqnew, newnanoparticle, nanoparticleemeai, emeaimatrix, matrixmany, manylimits, limitsanalysis
Measuring Inorganic Impurities in Semiconductor Manufacturing
2022|Agilent Technologies|Guides
Applications of ICP-MS Measuring Inorganic Impurities in Semiconductor Manufacturing Application Compendium > Return to table of contents > Search entire document Table of contents ICP-MS and ICP-QQQ in the Semiconductor Industry 4 Agilent Has Three Decades of ICP-MS Experience Driving…
Key words
return, returncontents, contentstable, tableicp, icpcps, cpsppt, pptgas, gassemiconductor, semiconductorconc, concqqq, qqqbec, becdocument, documententire, entiresearch, searchmode
