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Direct Analysis of Metallic Impurities in SiC and GaN Wafers by LA-GED-MSAG-ICP-MS/MS

Applications | 2023 | Agilent TechnologiesInstrumentation
ICP/MS, ICP/MS/MS, Laser ablation
Industries
Semiconductor Analysis
Manufacturer
Agilent Technologies
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Application Note Semiconductor Automated Surface Analysis of Metal Contaminants in Silicon Wafers by Online VPD-ICP-MS/MS Agilent 8900 ICP-QQQ integrated with IAS Expert PS VPD provides the sensitivity and robustness required for 24/7 contamination control of wafers Authors Introduction Tatsu Ichinose…
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Application Note Semiconductor Analysis of Metallic Impurities in Specialty Semiconductor Gases Using Gas Exchange Device (GED)-ICP-MS Measuring total metals and nanoparticles in HF and Cl2 gases using ICP-QQQ with GED and Metal Standard Aerosol Generation Authors Introduction Koshi Suzuki, Kohei…
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Applications of ICP-MS Measuring Inorganic Impurities in Semiconductor Manufacturing Application Compendium > Return to table of contents > Search entire document Table of contents ICP-MS and ICP-QQQ in the Semiconductor Industry 4 Agilent Has Three Decades of ICP-MS Experience Driving…
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Improvement of ICP-MS detectability of phosphorus and titanium in high purity silicon samples using the Agilent 8800 Triple Quadrupole ICP-MS Application note Semiconductor Authors Junichi Takahashi Agilent Technologies, Tokyo, Japan Introduction In the past three decades monitoring and controlling metallic…
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