Automated Surface Analysis of Metal Contaminants in Silicon Wafers by Online VPD-ICP-MS/MS
Aplikace | 2023 | Agilent TechnologiesInstrumentation
ICP/MS, ICP/MS/MS
IndustriesPolovodiče
ManufacturerAgilent Technologies
Key wordsvpd, wafer, fabs, icp, asas, surface, scan, semiconductor, system, integrated, automated, fab, droplet, expert, istd, elements, ultratrace, recovery, automatically, contaminants, ias, wafers, aqua, spike, used, solution, online, metal, ports, impurities, foups, ichinose, tatsu, fully, gas, min, carbothermic, foup, katsu, kawabata, qqq, microchips, can, vapor, tuning, planarization, fuming, computer, tune, monocrystalline
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