Analysis of 50 nm Silica Nanoparticles in Semiconductor Process Chemicals by spICP-MS/MS
Applications | 2023 | Agilent TechnologiesInstrumentation
ICP/MS, ICP/MS/MS
IndustriesSemiconductor Analysis
ManufacturerAgilent Technologies
Key wordsspicp, semiconductor, icp, nanoparticle, single, module, application, used, background, increasingly, rate, method, min, gas, masshunter, sensitivity, mode, fabrication, utilities, taiwan, cell, tra, flow, measurement, acceleration, meaning, technique, fast, arising, important, ipa, fewer, high, comprised, suppliers, accepted, separates, makeup, quality, beginning, axial, quartz, effectiveness, qqq, uptake, discrimination, achieving, manufacturers, ultrapure, from
Similar PDF
Measuring Inorganic Impurities in Semiconductor Manufacturing
2022|Agilent Technologies|Guides
Applications of ICP-MS Measuring Inorganic Impurities in Semiconductor Manufacturing Application Compendium > Return to table of contents > Search entire document Table of contents ICP-MS and ICP-QQQ in the Semiconductor Industry 4 Agilent Has Three Decades of ICP-MS Experience Driving…
Key words
return, returncontents, contentsicp, icptable, tablecps, cpsppt, pptgas, gassemiconductor, semiconductorconc, concqqq, qqqbec, becdocument, documententire, entiresearch, searchmode
Multielement Nanoparticle Analysis of Semiconductor Process Chemicals Using spICP-QQQ
2019|Agilent Technologies|Applications
Application Note Semiconductor Multielement Nanoparticle Analysis of Semiconductor Process Chemicals Using spICP-QQQ Characterization of Ag, Fe3O4, Al2O3, Au, and SiO2 NPs in TMAH in a single analytical run Author Yoshinori Shimamura, Donna Hsu, and Michiko Yamanaka Agilent Technologies, Inc. Introduction…
Key words
cps, cpsfrequency, frequencynanoparticle, nanoparticleparticle, particlecount, countnormalized, normalizedtmah, tmahsize, sizesec, secelement, elementintensity, intensitysignal, signalnanoparticles, nanoparticlestime, timenebulization
High sensitivity analysis of SiO2 nanoparticles using the Agilent 8900 ICP-QQQ in MS/MS mode
2016|Agilent Technologies|Applications
High sensitivity analysis of SiO2 nanoparticles using the Agilent 8900 ICP-QQQ in MS/MS mode Application note Materials, environmental, food Authors Michiko Yamanaka and Takayuki Itagaki Agilent Technologies, Japan Steve Wilbur Agilent Technologies, USA Introduction Nanomaterials are increasingly used in industrial…
Key words
particle, particleicp, icpnanoparticle, nanoparticlespicp, spicpsignal, signalpolyatomic, polyatomicinterferences, interferencesnps, npsnebulization, nebulizationsingle, singlemass, massqqq, qqqmeasured, measuredmodule, modulebackground
Analysis of Nanoparticles in Organic Reagents by Agilent 8900 ICP-QQQ in spICP-MS Mode
2019|Agilent Technologies|Applications
Application Note Semiconductor Analysis of Nanoparticles in Organic Reagents by Agilent 8900 ICP-QQQ in spICP-MS Mode Determination of 25 and 30 nm Fe3O4 NPs in low-particle concentration solutions Author Donna Hsu, Yoshinori Shimamura, Brian Liao, and Michiko Yamanaka1 Chun-Hua Chen…
Key words
particle, particlesize, sizefrequency, frequencynps, npsconcentration, concentrationspicp, spicpbuac, buacpgmea, pgmeacps, cpsipa, ipasignal, signalnormalized, normalizedspiked, spikedwere, wereparticles