Ultra-low level determination of phosphorus, sulfur, silicon and chlorine using the Agilent 8900 ICP-QQQ

Applications | 2018 | Agilent TechnologiesInstrumentation
Semiconductor Analysis
Agilent Technologies
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5th EditionHandbook of ICP-QQQApplications using theAgilent 8800 and 8900Primer > Return to table of contents> Search entire documentForewordAgilent Technologies launched its 8800 Triple QuadrupoleICP-MS (ICP-QQQ) at the 2012 Winter Conference on PlasmaSpectrochemistry in Tucson, Arizona, USA.By the time the first ICP-QQQ...
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Determination of trace elements inultrapure semiconductor grade sulfuricacid using the Agilent 8900 ICP-QQQ inMS/MS modeApplication noteSemiconductorAuthorsMichiko Yamanaka,Kazuo Yamanaka andNaoki Sugiyama,Agilent Technologies, JapanIntroductionIn the semiconductor industry, it is extremely important to reducecontamination within the manufacturing process, as particle-, metallic-, ororganic-based contaminants...
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Applications of ICP-MSMeasuring Inorganic Impuritiesin Semiconductor ManufacturingApplication Compendium > Return to table of contents> Search entire documentTable of contentsICP-MS and ICP-QQQ in the Semiconductor Industry4Agilent Has Three Decades of ICP-MS Experience DrivingContinuous Innovation7Agilent ICP-MS Solutions for the Semiconductor Industry8Automating Analysis of...
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Agilent ICP-MS JournalDecember 2016 – Issue 67Inside this Issue2-3Determination of Ultra Trace Elements in High PuritySulfuric Acid and Hydrogen Peroxide using ICP-QQQ4-5Sulfur Isotope Ratio Analysis in Mineral Waters usingICP-QQQ5Environmental Inorganic Speciation Analysis Testimonial6Analysis of TiO2 Nanoparticles using Single ParticleICP-QQQ7Spain Hosts...
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