Improvement of ICP-MS detectability of phosphorus and titanium in high purity silicon samples using the Agilent 8800 Triple Quadrupole ICP-MS
Applications | 2013 | Agilent TechnologiesInstrumentation
ICP/MS, ICP/MS/MS
IndustriesSemiconductor Analysis
ManufacturerAgilent Technologies
Key wordscool, gas, vpd, bec, tune, icp, silicon, cell, semiconductor, element, argon, plasma, qms, matrix, wafer, high, titanium, deposition, phosphorus, metallic, polyatomic, intense, min, hydrofluoric, conc, tuning, figures, tolerance, also, from, ions, sih, quadrupole, octp, downside, three, sioh, etch, takahashi, junichi, elements, sufficient, mass, spex, neutralize, noting, demountable, difficult, remove, does
Similar PDF
Measuring Inorganic Impurities in Semiconductor Manufacturing
2022|Agilent Technologies|Guides
Applications of ICP-MS Measuring Inorganic Impurities in Semiconductor Manufacturing Application Compendium > Return to table of contents > Search entire document Table of contents ICP-MS and ICP-QQQ in the Semiconductor Industry 4 Agilent Has Three Decades of ICP-MS Experience Driving…
Key words
return, returncontents, contentsicp, icptable, tablecps, cpsppt, pptgas, gassemiconductor, semiconductorconc, concqqq, qqqbec, becdocument, documententire, entiresearch, searchmode
Technical Overview and Performance Capability of the Agilent 7900s ICP-MS for Semiconductor Applications
2020|Agilent Technologies|Technical notes
White Paper Technical Overview and Performance Capability of the Agilent 7900s ICP-MS for Semiconductor Applications Introduction Agilent ICP-MS systems are widely used for accurate low-level analysis of trace contaminants across a wide range of high-purity chemicals used in the semiconductor…
Key words
plasma, plasmaicp, icpcool, coolhot, hotbec, beccou, couagilent, agilentsemiconductor, semiconductorpolyatomic, polyatomicipa, ipaelements, elementstive, tiveintelliquant, intelliquantundiluted, undilutedimproved
Automated Surface Analysis of Metal Contaminants in Silicon Wafers by Online VPD-ICP-MS/MS
2023|Agilent Technologies|Applications
Application Note Semiconductor Automated Surface Analysis of Metal Contaminants in Silicon Wafers by Online VPD-ICP-MS/MS Agilent 8900 ICP-QQQ integrated with IAS Expert PS VPD provides the sensitivity and robustness required for 24/7 contamination control of wafers Authors Introduction Tatsu Ichinose…
Key words
vpd, vpdwafer, wafericp, icpfabs, fabsasas, asassurface, surfacescan, scansemiconductor, semiconductorintegrated, integratedautomated, automatedsystem, systemexpert, expertelements, elementsdroplet, dropletfab
Analysis of Ultratrace Impurities in High Silicon Matrix Samples by ICP-QQQ
2021|Agilent Technologies|Applications
Application Note Semiconductor Analysis of Ultratrace Impurities in High Silicon Matrix Samples by ICP-QQQ Determination of 38 elements in high matrix samples using an Agilent 8900 ICP-QQQ with optional m-lens Authors Introduction Yu Ying Agilent Technologies (China) Co., Ltd. Rapid…
Key words
semiconductor, semiconductorbecs, becselements, elementsicp, icpmatrix, matrixgas, gasplasma, plasmabec, becsilicon, siliconeies, eiesbackground, backgroundomega, omegalens, lenstrace, tracedeposition