Library | LabRulez ICPMS

Spectrophotometric Spatial Profiling of Coated Optical Wafers

Applications

| 2020 | Agilent Technologies

NIR Spectroscopy, UV–VIS spectrophotometry

Instrumentation

NIR Spectroscopy, UV–VIS spectrophotometry

Manufacturer

Agilent Technologies

Industries

Materials Testing

Direct Analysis of Metallic Impurities in SiC and GaN Wafers by LA-GED-MSAG-ICP-MS/MS

Applications

| 2023 | Agilent Technologies

ICP/MS, ICP/MS/MS, Laser ablation

Instrumentation

ICP/MS, ICP/MS/MS, Laser ablation

Manufacturer

Agilent Technologies

Industries

Semiconductor Analysis

Automated Surface Analysis of Metal Contaminants in Silicon Wafers by Online VPD-ICP-MS/MS

Applications

| 2023 | Agilent Technologies

ICP/MS, ICP/MS/MS

Instrumentation

ICP/MS, ICP/MS/MS

Manufacturer

Agilent Technologies

Industries

Semiconductor Analysis

Coated Wafer Mapping Using UV-Vis Spectral Reflection and Transmission Measurements

Applications

| 2020 | Agilent Technologies

NIR Spectroscopy, UV–VIS spectrophotometry

Instrumentation

NIR Spectroscopy, UV–VIS spectrophotometry

Manufacturer

Agilent Technologies

Industries

Materials Testing, Semiconductor Analysis

Monitoring quality parameters in standard cleaning baths

Applications

| 2020 | Metrohm

NIR Spectroscopy

Instrumentation

NIR Spectroscopy

Manufacturer

Metrohm

Industries

Energy & Chemicals

Characterization of Surface Metal Contamination on Silicon Wafers Using Surface Metal Extraction Inductively Coupled Plasma Mass Spectrometry (SME- ICP-MS)

Applications

| 2001 | Agilent Technologies

ICP/MS

Instrumentation

ICP/MS

Manufacturer

Agilent Technologies

Industries

Semiconductor Analysis

Agilent ICP-MS Journal (April 2018. Issue 72)

Others

| 2018 | Agilent Technologies

ICP/MS, ICP/MS/MS

Instrumentation

ICP/MS, ICP/MS/MS

Manufacturer

Agilent Technologies

Industries

Food & Agriculture, Semiconductor Analysis

Online monitoring of sulfuric acid and hydrogen peroxide using Raman spectroscopy

Applications

| 2023 | Metrohm

RAMAN Spectroscopy

Instrumentation

RAMAN Spectroscopy

Manufacturer

Metrohm

Industries

Semiconductor Analysis

Characterization of Trace Impurities in Silicon Wafers by High Sensitivity Reaction Cell ICP-MS

Applications

| 2003 | Agilent Technologies

ICP/MS

Instrumentation

ICP/MS

Manufacturer

Agilent Technologies

Industries

Semiconductor Analysis

Agilent Atomic Spectroscopy Solutions for the Semiconductor Industry

Guides

| 2020 | Agilent Technologies

ICP/MS, ICP/OES, AAS, ICP/MS/MS, MP/ICP-AES

Instrumentation

ICP/MS, ICP/OES, AAS, ICP/MS/MS, MP/ICP-AES

Manufacturer

Agilent Technologies

Industries

Semiconductor Analysis

Spectrophotometric Spatial Profiling of Coated Optical Wafers

Direct Analysis of Metallic Impurities in SiC and GaN Wafers by LA-GED-MSAG-ICP-MS/MS

Automated Surface Analysis of Metal Contaminants in Silicon Wafers by Online VPD-ICP-MS/MS

Coated Wafer Mapping Using UV-Vis Spectral Reflection and Transmission Measurements

Monitoring quality parameters in standard cleaning baths

Characterization of Surface Metal Contamination on Silicon Wafers Using Surface Metal Extraction Inductively Coupled Plasma Mass Spectrometry (SME- ICP-MS)

Agilent ICP-MS Journal (April 2018. Issue 72)

Online monitoring of sulfuric acid and hydrogen peroxide using Raman spectroscopy

Characterization of Trace Impurities in Silicon Wafers by High Sensitivity Reaction Cell ICP-MS

Agilent Atomic Spectroscopy Solutions for the Semiconductor Industry

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