ICPMS webinars focusing on ICP/OES - page 11

Topics like Inter Element Correction (IEC) Factors, Advanced Valve System (AVS), and Fast Automated Curve-fitting Technique (FACT), etc...

We will cover steps to ensure maximum stability and robustness in organic solvent analysis using proper hardware selection, optimized plasma conditions, and background correction techniques.

This presentation will discuss the different types of interferences present in ICP and how to correct for them.

While many Semiconductor applications call for ppt levels and ICPMS analysis, there are many applications in this market that can utilize and ICP-OES for the analysis.

You are invited to join this free online event. Listen to user talks and use the opportunity to address your analytical questions to our application specialists.

This presentation will cover questions as it compares to AAS and ICP techniques. Learn the advantages of each techniques and which applications are best for each.

We will look at several advanced applications that do the seemingly impossible, from counting individual photons to looking inside exploding plasmas.

In the second part of the series, a demonstration of the new hardware and software will be given to make your method transfer seamless.

Topics include, but are not limited to Advanced Valve System (AVS). You don’t want to miss them! Come with all your questions for our immediate answers!

We will discuss key differences between the 700 and the new 5800, and 5900 models, including new features and major advantages.