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Determination of trace elements in ultrapure semiconductor grade sulfuric acid using the Agilent 8900 ICP-QQQ in MS/MS mode

 

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Applications of ICP-MS Measuring Inorganic Impurities in Semiconductor Manufacturing Application Compendium > Return to table of contents > Search entire document Table of contents ICP-MS and ICP-QQQ in the Semiconductor Industry 4 Agilent Has Three Decades of ICP-MS Experience Driving…
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5th Edition Handbook of ICP-QQQ Applications using the Agilent 8800 and 8900 Primer > Return to table of contents > Search entire document Foreword Agilent Technologies launched its 8800 Triple Quadrupole ICP-MS (ICP-QQQ) at the 2012 Winter Conference on Plasma…
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Agilent ICP-MS Journal December 2016 – Issue 67 Inside this Issue 2-3 Determination of Ultra Trace Elements in High Purity Sulfuric Acid and Hydrogen Peroxide using ICP-QQQ 4-5 Sulfur Isotope Ratio Analysis in Mineral Waters using ICP-QQQ 5 Environmental Inorganic…
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Application Note Semiconductor Analysis of Trace Metal Impurities in High Purity Hydrochloric Acid Using ICP-QQQ Authors Kazuo Yamanaka and Kazuhiro Sakai Agilent Technologies, Japan Introduction Hydrochloric acid (HCl) is a component of the standard RCA cleaning process used to remove…
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