Applications from the field of Semiconductor Analysis - page 2

Analysis of Trace Metal Impurities in High Purity Hydrochloric Acid Using ICP-QQQ

Applications

| 2017 | Agilent Technologies

ICP/MS, ICP/MS/MS

Instrumentation

ICP/MS, ICP/MS/MS

Manufacturer

Agilent Technologies

Industries

Semiconductor Analysis

Basic Performance of the Agilent 7700s ICP-MS for the Analysis of Semiconductor Samples

Technical notes

| 2010 | Agilent Technologies

ICP/MS

Instrumentation

ICP/MS

Manufacturer

Agilent Technologies

Industries

Semiconductor Analysis

Technical Overview and Performance Capability of the Agilent 7900s ICP-MS for Semiconductor Applications

Technical notes

| 2020 | Agilent Technologies

ICP/MS

Instrumentation

ICP/MS

Manufacturer

Agilent Technologies

Industries

Semiconductor Analysis

WCPS: AGILENT 8800 TRIPLE QUADRUPOLE ICP-MS WINTER PLASMA CONFERENCE 2012 POSTERS

Posters

| 2012 | Agilent Technologies

ICP/MS, ICP/MS/MS

Instrumentation

ICP/MS, ICP/MS/MS

Manufacturer

Agilent Technologies

Industries

Environmental, Semiconductor Analysis

Determination of Trace Metal Impurities in Semiconductor Grade Phosphoric Acid by High Sensitivity Reaction Cell ICP-MS

Applications

| 2003 | Agilent Technologies

ICP/MS

Instrumentation

ICP/MS

Manufacturer

Agilent Technologies

Industries

Semiconductor Analysis

Trace Elemental Analysis of Precursor Materials Using ICP-MS/MS

Applications

| 2025 | Agilent Technologies

ICP/MS, ICP/MS/MS

Instrumentation

ICP/MS, ICP/MS/MS

Manufacturer

Agilent Technologies

Industries

Semiconductor Analysis

Online monitoring of sulfuric acid and hydrogen peroxide using Raman spectroscopy

Applications

| 2023 | Metrohm

RAMAN Spectroscopy

Instrumentation

RAMAN Spectroscopy

Manufacturer

Metrohm

Industries

Semiconductor Analysis

C-Flow Nebulizer - Operating Instructions

Manuals

| 2020 | Savillex

Consumables, ICP/MS, ICP-OES, GD/MP/ICP-AES

Instrumentation

Consumables, ICP/MS, ICP-OES, GD/MP/ICP-AES

Manufacturer

Savillex

Industries

Semiconductor Analysis

Characterization of Trace Impurities in Silicon Wafers by High Sensitivity Reaction Cell ICP-MS

Applications

| 2003 | Agilent Technologies

ICP/MS

Instrumentation

ICP/MS

Manufacturer

Agilent Technologies

Industries

Semiconductor Analysis

Agilent ICP-MS Journal (March 2012 – Issue 49)

Others

| 2012 | Agilent Technologies

ICP/MS, ICP/MS/MS

Instrumentation

ICP/MS, ICP/MS/MS

Manufacturer

Agilent Technologies

Industries

Energy & Chemicals , Semiconductor Analysis