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Applications from the field of Semiconductor Analysis - page 2
WCPS: The Analysis and Stability of High Purity TetraMethylAm m onium Hyrdoxide (TMAH) with the Agilent 8900 QQQ-ICPMS
Posters
| 2018 | Agilent Technologies
ICP/MS, ICP/MS/MS
Instrumentation
ICP/MS, ICP/MS/MS
Manufacturer
Agilent Technologies
Industries
Semiconductor Analysis
Determination of Trace Metal Impurities in Semiconductor Grade Phosphoric Acid by High Sensitivity Reaction Cell ICP-MS
Applications
| 2003 | Agilent Technologies
ICP/MS
Instrumentation
ICP/MS
Manufacturer
Agilent Technologies
Industries
Semiconductor Analysis
WCPS: Ultratrace Analysis of Phosphorus, Boron and Other Impurities in Photovoltaic Silicon and Trichlorosilane by ICP-MS with High Energy Collision Cell
Posters
| 2011 | Agilent Technologies
ICP/MS
Instrumentation
ICP/MS
Manufacturer
Agilent Technologies
Industries
Semiconductor Analysis
Improvement of ICP-MS detectability of phosphorus and titanium in high purity silicon samples using the Agilent 8800 Triple Quadrupole ICP-MS
Applications
| 2013 | Agilent Technologies
ICP/MS, ICP/MS/MS
Instrumentation
ICP/MS, ICP/MS/MS
Manufacturer
Agilent Technologies
Industries
Semiconductor Analysis
WCPS: Determination of Ultra Trace Elements in High Purity Reagents by Automatic Standard Addition Methods Using prepFAST S - ICP-MS/MS
Posters
| 2018 | Agilent Technologies
Sample Preparation, ICP/MS, ICP/MS/MS
Instrumentation
Sample Preparation, ICP/MS, ICP/MS/MS
Manufacturer
Agilent Technologies, Elemental Scientific
Industries
Energy & Chemicals , Semiconductor Analysis
WCPS: Particle Analysis of Two High Purity Grades of N-Methyl-2- Pyrrolidone (NMP) using Single Particle (sp)ICP-MS/MS Method
Posters
| 2023 | Agilent Technologies
ICP/MS, ICP/MS/MS
Instrumentation
ICP/MS, ICP/MS/MS
Manufacturer
Agilent Technologies
Industries
Energy & Chemicals , Semiconductor Analysis
Agilent 7900s ICP-MS for Semiconductor Applications
Others
| 2020 | Agilent Technologies
ICP/MS
Instrumentation
ICP/MS
Manufacturer
Agilent Technologies
Industries
Semiconductor Analysis
Direct Measurement of Metallic Impurities in 20% Ammonium Hydroxide by 7700s/7900 ICP-MS
Applications
| 2017 | Agilent Technologies
ICP/MS
Instrumentation
ICP/MS
Manufacturer
Agilent Technologies
Industries
Semiconductor Analysis
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