Analysis of TFT glass

Importance of the Topic

Thin film transistor glass composition is crucial for the performance and durability of modern displays including laptops, monitors, smartphones, and navigation systems. Accurate, fast and non-destructive analytical techniques support quality control in glass manufacturing and ensure optimal chemical resistance and thermal stability.

Objectives and Overview of the Study

This study aims to establish a robust method for the quantitative analysis of major and trace oxides in TFT flat glass using the Thermo Scientific ARL PERFORM’X X-ray fluorescence spectrometer. Calibration strategies, detection limits and precision were evaluated to validate the approach.

Methodology

A series of flat glass standards covering typical oxide concentrations were measured. Calibration curves correlating XRF intensities with oxide content were constructed. Detection limits were determined under defined excitation and counting conditions. Repeatability tests involved multiple replicate analyses at various counting times to assess short-term precision.

Instrumentation Used

The analysis employed the ARL PERFORM’X 4200 W XRF spectrometer featuring:

• Rh X-ray tube with 50 μm Be window and low-current filament for stable performance across light and heavy elements
• Six primary beam filters, four collimators and up to nine analyzing crystals
• Detectors: flow proportional counter (FPC) and scintillation counter for specific elements
• Helium purge system and LoadSafe design for sample and chamber protection

Key Results and Discussion

Limits of detection for common glass oxides were in the sub-ppm to single-digit ppm range (e.g., B at 0.06 ppm, TiO2 at 0.7 ppm, SO3 at 0.8 ppm). Major oxide detection limits were not relevant as concentrations exceed LoD. Precision tests demonstrated relative standard deviations below 0.1% for major oxides with 10 s counting times and maintained excellent stability at varied counting durations. Boron analysis at 120 s showed RSD of 0.06% for B2O3.

Benefits and Practical Applications

The presented method offers:

• Rapid, non-destructive multi-element quantification
• High sensitivity for trace oxides and coloring agents
• Robust repeatability suitable for quality control in glass production
• Safety features enabling analysis of thin or liquid samples without damage

Future Trends and Potential Applications

Advances may include integration of AI-driven calibration models, enhanced detector technologies for lower detection limits, and in-situ XRF systems for real-time process monitoring. Expanding applications involve foldable display substrates, recycled glass quality assessment and broader environmental glass analysis.

Conclusion

The ARL PERFORM’X XRF spectrometer provides a reliable solution for quantitative oxide analysis in TFT glass, achieving sub-ppm detection, high precision and operational safety. This method supports stringent quality control in modern display glass manufacturing.