ICPMS
More information
WebinarsAbout usContact usTerms of use
LabRulez s.r.o. All rights reserved. Content available under a CC BY-SA 4.0 Attribution-ShareAlike
    1. Databases

    1. Industries

    1. Instrumentation

    1. Manufacturer

    1. Author

    1. Content Type

    1. Publication Date

    Ultra-low level determination of phosphorus, sulfur, silicon and chlorine using the Agilent 8900 ICP-QQQ

    Applications
    | 2018 | Agilent Technologies
    ICP/MS, ICP/MS/MS
    Instrumentation
    ICP/MS, ICP/MS/MS
    Manufacturer
    Agilent Technologies
    Industries
    Semiconductor Analysis

    WCPS: Determination of Ultra Trace Elements in High Purity Reagents by Automatic Standard Addition Methods Using prepFAST S - ICP-MS/MS

    Posters
    | 2018 | Agilent Technologies
    Sample Preparation, ICP/MS, ICP/MS/MS
    Instrumentation
    Sample Preparation, ICP/MS, ICP/MS/MS
    Manufacturer
    Agilent Technologies, Elemental Scientific
    Industries
    Energy & Chemicals , Semiconductor Analysis

    Characterization of Trace Impurities in Silicon Wafers by High Sensitivity Reaction Cell ICP-MS

    Applications
    | 2003 | Agilent Technologies
    ICP/MS
    Instrumentation
    ICP/MS
    Manufacturer
    Agilent Technologies
    Industries
    Semiconductor Analysis

    Direct Analysis of Trace Metallic Impurities in High Purity Hydrochloric Acid by 7700s/7900 ICP-MS

    Applications
    | 2017 | Agilent Technologies
    ICP/MS
    Instrumentation
    ICP/MS
    Manufacturer
    Agilent Technologies
    Industries
    Energy & Chemicals

    Using ICP-QQQ for UO2 + product ion measurement to reduce uranium hydride ion interference and enable trace 236U isotopic analysis

    Applications
    | 2016 | Agilent Technologies
    ICP/MS, ICP/MS/MS
    Instrumentation
    ICP/MS, ICP/MS/MS
    Manufacturer
    Agilent Technologies
    Industries
    Environmental, Energy & Chemicals

    Ultra trace measurement of potassium and other elements in ultrapure water using the Agilent 8800 ICP-QQQ in cool plasma reaction cell mode

    Applications
    | 2014 | Agilent Technologies
    ICP/MS, ICP/MS/MS
    Instrumentation
    ICP/MS, ICP/MS/MS
    Manufacturer
    Agilent Technologies
    Industries
    Semiconductor Analysis

    Direct Measurement of Metallic Impurities in 20% Ammonium Hydroxide by 7700s/7900 ICP-MS

    Applications
    | 2017 | Agilent Technologies
    ICP/MS
    Instrumentation
    ICP/MS
    Manufacturer
    Agilent Technologies
    Industries
    Semiconductor Analysis

    Determination of challenging elements in ultrapure semiconductor grade sulfuric acid by Triple Quadrupole ICP-MS

    Applications
    | 2015 | Agilent Technologies
    ICP/MS, ICP/MS/MS
    Instrumentation
    ICP/MS, ICP/MS/MS
    Manufacturer
    Agilent Technologies
    Industries
    Semiconductor Analysis

    Accurate Analysis of Trace Mercury in Cosmetics using the Agilent 8900 ICP-QQQ

    Applications
    | 2019 | Agilent Technologies
    ICP/MS, ICP/MS/MS
    Instrumentation
    ICP/MS, ICP/MS/MS
    Manufacturer
    Agilent Technologies
    Industries
    Others

    Trace level analysis of sulfur, phosphorus, silicon and chlorine in NMP using the Agilent 8800 Triple Quadrupole ICP-MS

    Applications
    | 2013 | Agilent Technologies
    ICP/MS, ICP/MS/MS
    Instrumentation
    ICP/MS, ICP/MS/MS
    Manufacturer
    Agilent Technologies
    Industries
    Pharma & Biopharma
     

    Related content


    All of you could do a PhD at Stanford or MIT

    Tu, 14.5.2024
    Vysoká škola chemicko-technologická v Praze

    Advances in Chromatography and Electrophoresis & Chiranal 2024 (Programme)

    Mo, 13.5.2024
    Advances in Chromatography and Electrophoresis & Chiranal

    Josef Michl, world-renowned Czech chemist, passes away

    Mo, 13.5.2024
    Ústav organické chemie a biochemie AV ČR
    Other projects
    Follow us
    More information
    WebinarsAbout usContact usTerms of use
    LabRulez s.r.o. All rights reserved. Content available under a CC BY-SA 4.0 Attribution-ShareAlike