Library | LabRulez ICPMS

Direct Analysis of Photoresist and Related Solvents Using the Agilent 7500cs ICP-MS

Applications

| 2004 | Agilent Technologies

ICP/MS

Instrumentation

ICP/MS

Manufacturer

Agilent Technologies

Industries

Semiconductor Analysis

The deep ultraviolet spectroscopic properties of a next-generation photoresist

Applications

| 2011 | Agilent Technologies

UV–VIS spectrophotometry

Instrumentation

UV–VIS spectrophotometry

Manufacturer

Agilent Technologies

Industries

Materials Testing, Semiconductor Analysis

Determination of Ultratrace Impurities in Semiconductor Photoresist Using ICP-MS/MS

Applications

| 2023 | Agilent Technologies

ICP/MS, ICP/MS/MS

Instrumentation

ICP/MS, ICP/MS/MS

Manufacturer

Agilent Technologies

Industries

Semiconductor Analysis

The determination of thin film thickness using reflectance spectroscopy

Applications

| 2011 | Agilent Technologies

UV–VIS spectrophotometry

Instrumentation

UV–VIS spectrophotometry

Manufacturer

Agilent Technologies

Industries

Materials Testing

Low reflectance measurements using the ‘VW’ technique

Technical notes

| 2011 | Agilent Technologies

NIR Spectroscopy, UV–VIS spectrophotometry

Instrumentation

NIR Spectroscopy, UV–VIS spectrophotometry

Manufacturer

Agilent Technologies

Industries

Trace level analysis of sulfur, phosphorus, silicon and chlorine in NMP using the Agilent 8800 Triple Quadrupole ICP-MS

Applications

| 2013 | Agilent Technologies

ICP/MS, ICP/MS/MS

Instrumentation

ICP/MS, ICP/MS/MS

Manufacturer

Agilent Technologies

Industries

Pharma & Biopharma

Multielement Nanoparticle Analysis of Semiconductor Process Chemicals Using spICP-QQQ

Applications

| 2019 | Agilent Technologies

ICP/MS, ICP/MS/MS

Instrumentation

ICP/MS, ICP/MS/MS

Manufacturer

Agilent Technologies

Industries

Semiconductor Analysis

Determination of trace elements in ultrapure semiconductor grade sulfuric acid using the Agilent 8900 ICP-QQQ in MS/MS mode

Applications

| 2018 | Agilent Technologies

ICP/MS, ICP/MS/MS

Instrumentation

ICP/MS, ICP/MS/MS

Manufacturer

Agilent Technologies

Industries

Semiconductor Analysis

Determination of ultra trace elements in high purity hydrogen peroxide with Agilent 8900 ICP-QQQ

Applications

| 2016 | Agilent Technologies

ICP/MS, ICP/MS/MS

Instrumentation

ICP/MS, ICP/MS/MS

Manufacturer

Agilent Technologies

Industries

Semiconductor Analysis

Automated Analysis of Semiconductor Grade Hydrogen Peroxide and DI Water using ICP-QQQ

Applications

| 2018 | Agilent Technologies

ICP/MS, ICP/MS/MS

Instrumentation

ICP/MS, ICP/MS/MS

Manufacturer

Agilent Technologies

Industries

Semiconductor Analysis

Direct Analysis of Photoresist and Related Solvents Using the Agilent 7500cs ICP-MS

The deep ultraviolet spectroscopic properties of a next-generation photoresist

Determination of Ultratrace Impurities in Semiconductor Photoresist Using ICP-MS/MS

The determination of thin film thickness using reflectance spectroscopy

Low reflectance measurements using the ‘VW’ technique

Trace level analysis of sulfur, phosphorus, silicon and chlorine in NMP using the Agilent 8800 Triple Quadrupole ICP-MS

Multielement Nanoparticle Analysis of Semiconductor Process Chemicals Using spICP-QQQ

Determination of trace elements in ultrapure semiconductor grade sulfuric acid using the Agilent 8900 ICP-QQQ in MS/MS mode

Determination of ultra trace elements in high purity hydrogen peroxide with Agilent 8900 ICP-QQQ

Automated Analysis of Semiconductor Grade Hydrogen Peroxide and DI Water using ICP-QQQ

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