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Applications from Agilent Technologies | LabRulez ICPMS
Ultra-low level determination of phosphorus, sulfur, silicon and chlorine using the Agilent 8900 ICP-QQQ
Applications
| 2018 | Agilent Technologies
ICP/MS, ICP/MS/MS
Instrumentation
ICP/MS, ICP/MS/MS
Manufacturer
Agilent Technologies
Industries
Semiconductor Analysis
WCPS: Determination of Ultra Trace Elements in High Purity Reagents by Automatic Standard Addition Methods Using prepFAST S - ICP-MS/MS
Posters
| 2018 | Agilent Technologies
Sample Preparation, ICP/MS, ICP/MS/MS
Instrumentation
Sample Preparation, ICP/MS, ICP/MS/MS
Manufacturer
Agilent Technologies, Elemental Scientific
Industries
Energy & Chemicals , Semiconductor Analysis
Characterization of Trace Impurities in Silicon Wafers by High Sensitivity Reaction Cell ICP-MS
Applications
| 2003 | Agilent Technologies
ICP/MS
Instrumentation
ICP/MS
Manufacturer
Agilent Technologies
Industries
Semiconductor Analysis
Ultra trace measurement of potassium and other elements in ultrapure water using the Agilent 8800 ICP-QQQ in cool plasma reaction cell mode
Applications
| 2014 | Agilent Technologies
ICP/MS, ICP/MS/MS
Instrumentation
ICP/MS, ICP/MS/MS
Manufacturer
Agilent Technologies
Industries
Semiconductor Analysis
Using ICP-QQQ for UO2 + product ion measurement to reduce uranium hydride ion interference and enable trace 236U isotopic analysis
Applications
| 2016 | Agilent Technologies
ICP/MS, ICP/MS/MS
Instrumentation
ICP/MS, ICP/MS/MS
Manufacturer
Agilent Technologies
Industries
Environmental, Energy & Chemicals
Direct Analysis of Trace Metallic Impurities in High Purity Hydrochloric Acid by 7700s/7900 ICP-MS
Applications
| 2017 | Agilent Technologies
ICP/MS
Instrumentation
ICP/MS
Manufacturer
Agilent Technologies
Industries
Energy & Chemicals
Determination of challenging elements in ultrapure semiconductor grade sulfuric acid by Triple Quadrupole ICP-MS
Applications
| 2015 | Agilent Technologies
ICP/MS, ICP/MS/MS
Instrumentation
ICP/MS, ICP/MS/MS
Manufacturer
Agilent Technologies
Industries
Semiconductor Analysis
Direct Measurement of Metallic Impurities in 20% Ammonium Hydroxide by 7700s/7900 ICP-MS
Applications
| 2017 | Agilent Technologies
ICP/MS
Instrumentation
ICP/MS
Manufacturer
Agilent Technologies
Industries
Semiconductor Analysis
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LabRulez s.r.o. All rights reserved. Content available under a CC BY-SA 4.0 Attribution-ShareAlike