Applications from the field of Semiconductor Analysis | LabRulez ICPMS

Quality Control of Laminates

Applications

| 2021 | Metrohm

NIR Spectroscopy

Instrumentation

NIR Spectroscopy

Manufacturer

Metrohm

Industries

Semiconductor Analysis

Quality control of semiconductor acid baths as per ASTM E1655 – Time- and cost-efficient with NIRS

Technical notes

| 2021 | Metrohm

NIR Spectroscopy

Instrumentation

NIR Spectroscopy

Manufacturer

Metrohm

Industries

Semiconductor Analysis

Online monitoring of sulfuric acid and hydrogen peroxide using Raman spectroscopy

Applications

| 2023 | Metrohm

RAMAN Spectroscopy

Instrumentation

RAMAN Spectroscopy

Manufacturer

Metrohm

Industries

Semiconductor Analysis

Agilent Atomic Spectroscopy Solutions for the Semiconductor Industry

Guides

| 2020 | Agilent Technologies

ICP/MS, ICP/OES, AAS, ICP/MS/MS, MP/ICP-AES

Instrumentation

ICP/MS, ICP/OES, AAS, ICP/MS/MS, MP/ICP-AES

Manufacturer

Agilent Technologies

Industries

Semiconductor Analysis

Agilent ICP-MS Journal (July 2017 – Issue 69)

Others

| 2017 | Agilent Technologies

ICP/MS

Instrumentation

ICP/MS

Manufacturer

Agilent Technologies

Industries

Environmental, Pharma & Biopharma, Semiconductor Analysis

Agilent ICP-MS Journal (April 2018. Issue 72)

Others

| 2018 | Agilent Technologies

ICP/MS, ICP/MS/MS

Instrumentation

ICP/MS, ICP/MS/MS

Manufacturer

Agilent Technologies

Industries

Food & Agriculture, Semiconductor Analysis

Determination of Ultratrace Impurities in Semiconductor Photoresist Using ICP-MS/MS

Applications

| 2023 | Agilent Technologies

ICP/MS, ICP/MS/MS

Instrumentation

ICP/MS, ICP/MS/MS

Manufacturer

Agilent Technologies

Industries

Semiconductor Analysis

WCPS: Particle Analysis of Two High Purity Grades of N-Methyl-2- Pyrrolidone (NMP) using Single Particle (sp)ICP-MS/MS Method

Posters

| 2023 | Agilent Technologies

ICP/MS, ICP/MS/MS

Instrumentation

ICP/MS, ICP/MS/MS

Manufacturer

Agilent Technologies

Industries

Energy & Chemicals , Semiconductor Analysis

Ultra-low level determination of phosphorus, sulfur, silicon and chlorine using the Agilent 8900 ICP-QQQ

Applications

| 2018 | Agilent Technologies

ICP/MS, ICP/MS/MS

Instrumentation

ICP/MS, ICP/MS/MS

Manufacturer

Agilent Technologies

Industries

Semiconductor Analysis

Automated Surface Analysis of Metal Contaminants in Silicon Wafers by Online VPD-ICP-MS/MS

Applications

| 2023 | Agilent Technologies

ICP/MS, ICP/MS/MS

Instrumentation

ICP/MS, ICP/MS/MS

Manufacturer

Agilent Technologies

Industries

Semiconductor Analysis

Applications from the field of Semiconductor Analysis | LabRulez ICPMS

Quality Control of Laminates

Quality control of semiconductor acid baths as per ASTM E1655 – Time- and cost-efficient with NIRS

Online monitoring of sulfuric acid and hydrogen peroxide using Raman spectroscopy

Agilent Atomic Spectroscopy Solutions for the Semiconductor Industry

Agilent ICP-MS Journal (July 2017 – Issue 69)

Agilent ICP-MS Journal (April 2018. Issue 72)

Determination of Ultratrace Impurities in Semiconductor Photoresist Using ICP-MS/MS

WCPS: Particle Analysis of Two High Purity Grades of N-Methyl-2- Pyrrolidone (NMP) using Single Particle (sp)ICP-MS/MS Method

Ultra-low level determination of phosphorus, sulfur, silicon and chlorine using the Agilent 8900 ICP-QQQ

Automated Surface Analysis of Metal Contaminants in Silicon Wafers by Online VPD-ICP-MS/MS

Related content

Gerrit Angst awarded the Lumina quaeruntur premium. He will start a new research team

New approach enhances muscle recovery in aged mice

Scientists from IOCB Prague are expanding the possibilities of using RNA in gene medicine