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Tips to High Throughput Analysis of Additives and Wear metals by ICP-OES

RECORD | Already taken place Tu, 22.4.2025
This presentation will focus on the set up and optimization of a high throughput (<30 seconds, sample to sample) wear metals methodology.
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Agilent Technologies: Tips to High Throughput Analysis of Additives and Wear metals by ICP-OES
Agilent Technologies: Tips to High Throughput Analysis of Additives and Wear metals by ICP-OES

Wear metals analysis D-5185, can be done quickly using the right conditions and instrumentation.  Large Laboratories require speed as well as data quality.  Some laboratories run upwards of 2000 samples per day. This presentation will focus on the set up and optimization of a high throughput (<30 seconds, sample to sample) wear metals methodology.  

We will look at optimizing the AVS 6 valve for the best combination of speed and performance.  You will learn the best way to optimize your operating conditions for organics as well as a simple approach for sample and standard preparation.

Presenter: Paul Krampitz (Application Scientist, Agilent Technologies, Inc.)

Paul is a graduate of Bowling Green State University with a Chemistry Bachelor of Science degree. Twenty – five years of Spectroscopy experience mainly Inductively Coupled Plasma (ICP) Spectroscopy as well as ICP-MS and AAS. His experience also includes X-Ray Fluorescence (ED, WD), Laser Ablation, Inorganic Speciation and Microwave Plasma Spectroscopy. Market Segment expertise includes environmental, petrochemical, metallurgical applications.

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