Semiconductor Specialty Gas Analysis Using GDI-ICP-MS
In semiconductor fabrication, it is imperative to be able to control impurities in specialty gases, as otherwise they will lead to unwanted formation of deposits on the wafer surface, adversely affecting device performance and yield, and carbon monoxide (CO) is no exception. The industry’s traditional method to test for metallic impurities in specialty gases is the impinger one, which has some limitations with the impurities exchange to the liquid media and requires extended sample prep time.
In this webinar, you will learn about an alternative sample prep method using a gas exchange device. In the application discussed, we collaborated with BASS Inc of Korea, to show how their gas direct injection (known as GDI), is a technique that enables the direct analysis of a sample gas without the need to utilize an impinger. Coupling the GDI to the NexION® 2200 ICP-MS, you will discover its benefits over the traditional impinger method in metal-impurity analysis of CO. These include lower detection limits and background equivalent concentrations as well as a significant reduction in analysis time.
Key Learnings:
- Introduction to BASS Inc. GDI (Gas Direct Injection) system.
- Advantage of GDI-ICP-MS technique
- Analysis of special gas for semiconductor application with NexIon ICP-MS series
