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Automated Online Semiconductor Monitoring with ScoutDX, ScoutNANO, and RadianVPD

RECORD | Already taken place Su, 1.1.2023
Elemental Scientific offers a wide range of products to monitor contamination in semiconductor materials.
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Agilent Technologies: Automated Online Semiconductor Monitoring with ScoutDX, ScoutNANO, and RadianVPD
Agilent Technologies: Automated Online Semiconductor Monitoring with ScoutDX, ScoutNANO, and RadianVPD

Automatic determination of ionic and nanoparticle contamination in semiconductor process chemicals and on silicon production wafers has become increasingly important.

Elemental Scientific offers a wide range of products to monitor contamination in semiconductor materials. ScoutDX enables online, automated determination of single digit and sub-ppt ionic contamination in a wide range of process chemicals at greater than 300m distances. ScoutNANO adds the capability to perform automated nanoparticle determination, reference material calibration, and hardware for long-term nanoparticle solution stability. RadianVPD is a high speed VPD system for determining on-wafer contamination, offering the highest throughput VPD system available with a wide range of options for both production and R&D environments.

Presenter: Kyle Uhlmeyer (RadianVPD Applications Manager, Elemental Scientific)

Kyle Uhlmeyer is the RadianVPD applications manager for Elemental Scientific. He has been with ESI for more than 10 years, and worked on a wide range of projects. In the past 5 years he has helped develop, install, and support semiconductor products such as ScoutDX, prepFAST S, and RadianVPD.

Presenter: Austin Schultz (Project Engineer, Elemental Scientific)

Austin Schultz is a project engineer for Elemental Scientific. In his 10 years at ESI he has helped develop products ranging from hydride generation to inline-autodilution to low viscosity sample transfer, he specializes in ultrapure chemical analysis for semiconductor customers.

Presenter: Bert Woods (Application Scientist, Agilent Technologies, Inc.)

Joined the Agilent ICP-MS team in 2004, with previous employment in the semiconductor industry with Dominion Semiconductor (IBM/Toshiba) and Micron. Bert is a 1997 Chemistry graduate of Radford University in Virginia and an avid Washington DC Sports fan.

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