Routine analysis of 6N high purity copper

Importance of the Topic

High purity metals such as 6N copper (99.9999% purity) require comprehensive monitoring of trace impurities at single-digit ng·g−1 levels to meet stringent quality specifications in industries like electronics and semiconductors.

Goals and Overview of the Study

This study evaluates the performance of the Thermo Scientific™ Element™ GD Plus high-resolution glow discharge sector-field mass spectrometer for routine, ultra-trace impurity analysis in high purity copper, emphasizing rapid turnaround and minimal sample preparation.

Methodology and Instrumentation Used

Sample surfaces were prepared by wet grinding with SiC paper (grit 120), with milling as an alternative. Key instrumental settings included:

• Matrix sensitivity: 2×10^10 cps (medium resolution for Cu)
• Pre-sputter time: 5 min
• Acquisition time: 5 min
• Discharge current: 45 mA
• Discharge voltage: ~750 V
• Anode material: high purity graphite

Automatic resolution switching (<1 s) enabled optimal removal of polyatomic interferences.

Main Results and Discussion

Detection limits below 0.01 µg·g−1 were achieved for Ag, As, Bi, Fe, Pb, Sb, Se, Te and 0.03 µg·g−1 for S. The workflow delivered up to 5 analyses per hour (~120 per day). One-point calibration with a certified reference material provided accurate quantification due to system linearity, while the Standard RSF calibration strategy enabled semi-quantitative results within ±30% when standards were unavailable. High-resolution spectra successfully separated CuAr interferences from 103Rh.

Benefits and Practical Applications

• Ultra-trace detection capability for production quality control
• High throughput supporting multi-shift operation
• Simple operation suitable for routine use by shift operators
• Robust interference removal via fast resolution switching

Future Trends and Potential Uses

Future developments may include automated sample preparation, integration with laboratory information management systems for real-time feedback, and application to other high purity metals and alloys. Enhanced throughput and lower detection thresholds will meet growing demands in semiconductor manufacturing and advanced materials research.

Conclusion

The Element GD Plus MS offers a robust, high-throughput solution for ultra-trace impurity analysis in 5N/6N copper, achieving detection limits below 0.01 µg·g−1 and rapid turnaround, making it ideal for routine production quality control environments.