TTK 600 Low-Temperature Chamber
Brochures and specifications | 2015 | Anton PaarInstrumentation
The ability to conduct in situ X-ray diffraction experiments across a wide temperature range is critical for understanding phase transitions, reaction kinetics and structural stability in various materials. The TTK 600 chamber extends these capabilities to temperatures from –190 °C to 600 °C, supporting research in pharmaceuticals, inorganic materials and industrial processes.
This document introduces the TTK 600 Low-Temperature Chamber, a modular sample stage designed to deliver precise temperature control and rapid heating/cooling for reflection and transmission XRD geometries. It aims to present configurations, key features and practical benefits for routine and advanced laboratory applications.
The TTK 600 enables in situ diffraction by integrating a high-precision Pt100 temperature sensor close to the sample, optimized heat transfer elements and optional convection heaters to minimize gradients. Temperature control can be achieved via liquid nitrogen cooling (–190 °C to 600 °C) or compressed-air cooling (–10 °C to 600 °C), under vacuum, inert gas or air atmospheres.
Performance evaluation highlights rapid thermal ramps, excellent stability and uniformity across the entire temperature span. The chamber accommodates various sample types with minimal background noise, facilitated by a beam knife at low angles and zero-background holders for transparent specimens. Scan range extends from 0° to 164° 2θ in reflection mode.
Emerging applications include time-resolved kinetics studies, integration with complementary techniques (e.g., spectroscopy), and automated sample handling for high-throughput screening. Advances in sensor technology and software integration will further enhance usability and data quality.
The TTK 600 chamber offers a robust, adaptable platform for in situ XRD, delivering rapid temperature changes, precise control and versatile sample compatibility. It supports a wide spectrum of research and quality-control activities by enabling reliable experiments under extreme thermal conditions.
XRD, Consumables
IndustriesOther
ManufacturerAnton Paar
Summary
Importance of the Topic
The ability to conduct in situ X-ray diffraction experiments across a wide temperature range is critical for understanding phase transitions, reaction kinetics and structural stability in various materials. The TTK 600 chamber extends these capabilities to temperatures from –190 °C to 600 °C, supporting research in pharmaceuticals, inorganic materials and industrial processes.
Objectives and Overview
This document introduces the TTK 600 Low-Temperature Chamber, a modular sample stage designed to deliver precise temperature control and rapid heating/cooling for reflection and transmission XRD geometries. It aims to present configurations, key features and practical benefits for routine and advanced laboratory applications.
Methodology and Instrumentation
The TTK 600 enables in situ diffraction by integrating a high-precision Pt100 temperature sensor close to the sample, optimized heat transfer elements and optional convection heaters to minimize gradients. Temperature control can be achieved via liquid nitrogen cooling (–190 °C to 600 °C) or compressed-air cooling (–10 °C to 600 °C), under vacuum, inert gas or air atmospheres.
Used Instrumentation
- TTK 600 Low-Temperature Chamber sample stage
- Combined Control Unit (CCU) for temperature stability and refrigerant management
- Standard, capillary and optimized transmission sample holders
- Two-circle diffractometer with RS232 interface
Main Results and Discussion
Performance evaluation highlights rapid thermal ramps, excellent stability and uniformity across the entire temperature span. The chamber accommodates various sample types with minimal background noise, facilitated by a beam knife at low angles and zero-background holders for transparent specimens. Scan range extends from 0° to 164° 2θ in reflection mode.
Benefits and Practical Applications
- In situ analysis of pharmaceuticals, organics and inorganic compounds
- Polymorph screening and phase identification
- Accurate lattice parameter determination
- Crystal structure investigations under controlled environments
Future Trends and Potential Applications
Emerging applications include time-resolved kinetics studies, integration with complementary techniques (e.g., spectroscopy), and automated sample handling for high-throughput screening. Advances in sensor technology and software integration will further enhance usability and data quality.
Conclusion
The TTK 600 chamber offers a robust, adaptable platform for in situ XRD, delivering rapid temperature changes, precise control and versatile sample compatibility. It supports a wide spectrum of research and quality-control activities by enabling reliable experiments under extreme thermal conditions.
Content was automatically generated from an orignal PDF document using AI and may contain inaccuracies.
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