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Measuring optical filters

Applications | 2011 | Agilent TechnologiesInstrumentation
UV–VIS spectrophotometry
Industries
Materials Testing
Manufacturer
Agilent Technologies

Summary

Significance of the Topic


Accurate measurement of optical filters is critical for isolating specific spectral bands in spectroscopy, optical instrumentation and industrial analysis. Bandpass filters exhibit angular and polarization sensitivity that can compromise resolution and transmission accuracy, especially for narrowband applications.

Objectives and Study Overview


This study aims to evaluate techniques to mitigate angular and polarization effects in bandpass filter measurements, assess blocking performance, and apply instrument corrections to improve data reliability. Two filters (0.3 nm FWHM at 630 nm and 50 nm FWHM at 260 nm) and a sharp-cut filter were analyzed under various configurations.

Methodology and Instrumentation


The Cary 5 UV-Vis-NIR spectrophotometer was used to explore optimal instrument settings including spectral band width (SBW), signal averaging time (SAT), data interval and beam geometry. Effects of slit height reduction, beam masking and depolarization were examined to control solid angle and polarization sensitivity. Instrumental stray light and baseline errors were corrected using an adaptation of ASTM E903.

Used Instrumentation

  • Cary 5 UV-Vis-NIR spectrophotometer
  • Solid sample holders
  • 2 mm beam masks
  • Glan–Taylor polarizer
  • Depolarizer

Main Results and Discussion


Reducing SBW to less than one tenth of the expected filter bandwidth ensured accurate resolution. Slit height reduction and the use of 5 mm and 2 mm apertures progressively narrowed the measured FWHM of the 0.3 nm filter from 0.462 nm to 0.360 nm, while the 50 nm filter remained unaffected. Beam masking also increased peak transmission and improved symmetry. Blocking performance up to six absorbance units was achieved, and stray light corrections based on ASTM E903 significantly improved low-transmittance accuracy. Depolarization eliminated polarization artifacts at the grating transition.

Benefits and Practical Applications


The optimized measurement approach delivers high-precision filter characterization essential for quality assurance in optical component manufacturing, analytical laboratories and spectroscopic instrumentation design.

Future Trends and Opportunities


Advances may include automated beam-angle control, integrated polarization scramblers, higher-resolution detectors, and software-driven corrections. Emerging spectrophotometers with expanded dynamic range and AI-assisted data processing will further enhance filter evaluation.

Conclusion


This work demonstrates that careful control of instrument parameters and the application of beam masking, depolarization and data corrections enable reliable characterization of narrowband and broadband optical filters.

Reference

  • ASTM Standards on Color and Appearance Measurement, American Society for Testing and Materials, Philadelphia, 1987

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