Determination of Trace Impurities in High-Purity Copper by Sequential ICP-OES with Axial Viewing
Applications | 2010 | Agilent TechnologiesInstrumentation
ICP/OES
IndustriesEnergy & Chemicals
ManufacturerAgilent Technologies
Key wordsviewing, plasma, lines, emission, copper, inductively, icp, purity, oes, atomic, radial, axial, axially, used, background, correction, objects, usable, coupled, flame, trace, viewed, impurities, bronzes, coppers, graphite, antiquities, nonspectral, analysis, sequential, instrumental, were, limits, found, matching, high, validated, chamber, effected, actual, usually, liberty, archaeological, rsdb, spray, elements, ancient, certified, interferences, determination
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