Gaining Deeper Insights into Thin Film Response
Applications | 2022 | Agilent TechnologiesInstrumentation
High‐precision measurement of optical constants in thin film materials is critical for design and manufacture of multilayer coatings used in optics and photonics. Uncertainties in transmittance and reflectance spectra can lead to errors in film thickness and refractive index determination, impacting device performance. A robust approach to minimize systematic errors enhances reliability in both research and industrial quality control.
This study demonstrates how coupling an Agilent Cary 5000 UV‐Vis‐NIR spectrophotometer with a Universal Measurement Accessory (UMA) provides deeper insights into thin film response by:
Samples consisted of Ta2O5 films (~292 nm) deposited on Suprasil substrates via magnetron sputtering. Measurements were conducted for s‐polarized light at 7° and 10° incidence:
The UMA allows absolute specular R and T measurement without repositioning the sample, ensuring identical sample location for both measurements. A second UMA unit was used months later for reproducibility tests.
When T and R were measured at different AOI, total losses TL(λ)=100%−R(10°)−T(7°) exhibited oscillations of ~0.4%, matching theoretical predictions for a 3° AOI difference. By measuring both channels at the same AOI, oscillations disappeared, confirming AOI mismatch as the primary source. Repeated tests on a second UMA unit showed residual deviations under 0.15%, consistent with a thickness nonuniformity of ~0.3 nm (0.1% of film thickness), and demonstrated excellent inter‐instrument reproducibility.
The UMA‐equipped Cary 5000 offers:
Advancements may include integration of multiangle spectral photometry with ellipsometry and spectroscopic imaging to extend characterization across broader wavelength ranges and complex film stacks. Inline measurement in deposition systems and automated data analysis using machine‐learning algorithms promise real‐time process control and faster development cycles.
Using a UMA with a Cary 5000 spectrophotometer effectively overcomes systematic oscillations in thin film total loss spectra by aligning AOI for transmittance and reflectance. Residual oscillations due to film thickness nonuniformity are minimal and predictable. The approach provides reliable, reproducible optical characterization essential for research and industrial coating applications.
NIR Spectroscopy, UV–VIS spectrophotometry
IndustriesMaterials Testing
ManufacturerAgilent Technologies
Summary
Importance of the Topic
High‐precision measurement of optical constants in thin film materials is critical for design and manufacture of multilayer coatings used in optics and photonics. Uncertainties in transmittance and reflectance spectra can lead to errors in film thickness and refractive index determination, impacting device performance. A robust approach to minimize systematic errors enhances reliability in both research and industrial quality control.
Objectives and Study Overview
This study demonstrates how coupling an Agilent Cary 5000 UV‐Vis‐NIR spectrophotometer with a Universal Measurement Accessory (UMA) provides deeper insights into thin film response by:
- Eliminating spectral oscillations caused by angle of incidence (AOI) mismatches in separate transmittance and reflectance measurements.
- Quantifying the residual impact of film thickness nonuniformity on total losses.
- Assessing inter‐instrument reproducibility across multiple UMA units.
Methodology and Used Instrumentation
Samples consisted of Ta2O5 films (~292 nm) deposited on Suprasil substrates via magnetron sputtering. Measurements were conducted for s‐polarized light at 7° and 10° incidence:
- Transmittance (T) at 7° and 10°.
- Reflectance (R) at 10°.
The UMA allows absolute specular R and T measurement without repositioning the sample, ensuring identical sample location for both measurements. A second UMA unit was used months later for reproducibility tests.
Main Results and Discussion
When T and R were measured at different AOI, total losses TL(λ)=100%−R(10°)−T(7°) exhibited oscillations of ~0.4%, matching theoretical predictions for a 3° AOI difference. By measuring both channels at the same AOI, oscillations disappeared, confirming AOI mismatch as the primary source. Repeated tests on a second UMA unit showed residual deviations under 0.15%, consistent with a thickness nonuniformity of ~0.3 nm (0.1% of film thickness), and demonstrated excellent inter‐instrument reproducibility.
Benefits and Practical Applications
The UMA‐equipped Cary 5000 offers:
- High accuracy in thin film optical characterization by removing AOI errors.
- Rapid and complete data acquisition at a single sample point.
- Reproducible results across multiple instruments, supporting consistent quality control in production environments.
Future Trends and Applications
Advancements may include integration of multiangle spectral photometry with ellipsometry and spectroscopic imaging to extend characterization across broader wavelength ranges and complex film stacks. Inline measurement in deposition systems and automated data analysis using machine‐learning algorithms promise real‐time process control and faster development cycles.
Conclusion
Using a UMA with a Cary 5000 spectrophotometer effectively overcomes systematic oscillations in thin film total loss spectra by aligning AOI for transmittance and reflectance. Residual oscillations due to film thickness nonuniformity are minimal and predictable. The approach provides reliable, reproducible optical characterization essential for research and industrial coating applications.
References
- Amotchkina TV et al. Oscillations in Spectral Behavior of Total Losses (1−R−T) in Thin Dielectric Films. Optics Express. 2012;20(14):16129–44.
- Tikhonravov AV et al. Effect of Systematic Errors in Spectral Photometric Data on the Accuracy of Determination of Optical Parameters of Dielectric Thin Films. Appl. Opt. 2002;41:2555–2560.
- Woollam J. Ellipsometry, Variable Angle Spectroscopic. Wiley Encyclopedia of Electrical and Electronics Engineering. 2000;Supplement 1.
- Tikhonravov AV et al. Optical Parameters of Oxide Films Typically Used in Optical Coating Production. Appl. Opt. 2011;50:C75–C85.
- Tikhonravov A et al. Reliable Determination of Wavelength Dependence of Thin Film Refractive Index. Proc. SPIE. 2003;5188:331–342.
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