ICPMS
More information
WebinarsAbout usContact usTerms of use
LabRulez s.r.o. All rights reserved. Content available under a CC BY-SA 4.0 Attribution-ShareAlike

Fitted Background Correction (FBC) — fast, accurate and fully-automated background correction

Technical notes | 2019 | Agilent TechnologiesInstrumentation
ICP-OES
Industries
Manufacturer
Agilent Technologies

Summary

Significance of the Topic


Background correction is essential in ICP-OES for reliable analyte quantification under varying plasma and matrix conditions. Inconsistent or complex background signals, arising from argon plasma continuum, spectral interferences or sample matrices, can degrade detection limits and accuracy.

Objectives and Overview of the Article


This article introduces a fully automated fitted background correction (FBC) method implemented on Agilent 5800 and 5900 ICP-OES instruments. It compares FBC with traditional off-peak background correction (OPBC) and highlights FBC’s capabilities in handling simple and complex spectral backgrounds without manual method development.

Methodology and Instrumentation


FBC employs a mathematical model to deconvolute background and analyte signals using:
  • Offset component for the unstructured continuum baseline
  • Slope component for wings of distant peaks
  • Gaussian components to represent the analyte peak and neighboring interferents
  • An iterative least-squares algorithm to refine peak positions, widths and intensities
Used Instrumentation:
  • Agilent 5800 ICP-OES
  • Agilent 5900 ICP-OES

Main Results and Discussion


Experimental examples demonstrate:
  • In deionized water, both OPBC and FBC yield accurate baselines for simple spectra
  • In high aluminum matrices, FBC corrects curved backgrounds caused by spectral broadening that defeat OPBC
  • When molybdenum interferences obscure lead lines, FBC isolates the true background, enabling precise lead quantification
These cases illustrate FBC’s robustness across diverse sample challenges.

Benefits and Practical Application of the Method


FBC delivers:
  • Fully automated background correction without time-consuming method setup
  • Accurate baseline modeling for simple and complex interferences
  • Improved detection limits and data reliability in routine and challenging analyses

Future Trends and Opportunities for Use


Advancements may include:
  • Integration of machine learning to further adapt background models
  • Extension of algorithmic correction to simultaneous multi-element and multi-line analysis
  • Application to other atomic spectrometry techniques and detection platforms

Conclusion


Fitted background correction on Agilent 5800 and 5900 ICP-OES systems represents a significant step toward fully automated, accurate spectral baseline removal. By eliminating manual method development and accommodating complex matrices, FBC enhances analytical throughput and reliability in diverse laboratory settings.

Reference


No literature references were provided in the source document.

Content was automatically generated from an orignal PDF document using AI and may contain inaccuracies.

Downloadable PDF for viewing
 

Similar PDF

Toggle
Fitted Background Correction (FBC)— fast, accurate and fully-automated background correction
Fitted Background Correction (FBC)— fast, accurate and fully-automated background correction Technical Overview 5100 ICP-OES Introduction It’s commonplace in ICP-OES for background (baseline) correction to be applied on the total signal observed for an analyte emission line. This is because many…
Key words
background, backgroundcorrection, correctionfbc, fbcfitted, fittedsignal, signaloes, oescontinuum, continuumemission, emissionpeak, peakicp, icpwavelength, wavelengthanalyte, analyteplasma, plasmaoff, offopbc
‘Fitted’ — Fast, accurate and fully- automated background correction
‘Fitted’ — Fast, accurate and fullyautomated background correction Technical overview Introduction It’s commonplace in ICP-OES for background (baseline) correction to be applied on the total signal observed for an analyte emission line. This is because many factors influence the background…
Key words
background, backgroundcorrection, correctionfbc, fbcsignal, signalfind, findoes, oesspecific, specificemission, emissionicp, icpwavelength, wavelengthplasma, plasmaoff, offopbc, opbcobserved, observedfitted
Agilent 720/725 ICP-OES
Agilent 720/725 ICP-OES
2012|Agilent Technologies|Brochures and specifications
Agilent 720/725 ICP-OES RELIABLE. PRODUCTIVE. ROBUST. AGILENT TECHNOLOGIES 720/725 ICP-OES The world’s best ICP-OES The Agilent 720/725 ICP-OES systems are the world’s most productive highperformance and only truly simultaneous ICP-OES. The Agilent 720/725 ICP-OES offer the finest performance, nce, speed…
Key words
multical, multicalagilent, agilenticp, icpwavelength, wavelengthmetals, metalsvistachip, vistachipelements, elementsremarkably, remarkablyfact, facttechnologies, technologiescorrection, correctionsoftware, softwarecoverage, coverageproductive, productiveexpert
Determination of Elemental Impurities in Lithium Hydroxide Using ICP-OES
Application Note Energy and Chemicals Determination of Elemental Impurities in Lithium Hydroxide Using ICP-OES Quality assurance of lithium-ion battery precursor chemicals by Agilent 5800 VDV ICP-OES Authors Introduction Ying Qi and Neli Drvodelic Driven by demand from high tech industries…
Key words
axial, axialfitted, fittedavs, avsintelliquant, intelliquantoes, oesicp, icplioh, liohemf, emffbc, fbclod, lodsample, samplefact, factmaintenance, maintenancevalve, valvewavelength
Other projects
GCMS
LCMS
Follow us
FacebookLinkedInYouTube
More information
WebinarsAbout usContact usTerms of use
LabRulez s.r.o. All rights reserved. Content available under a CC BY-SA 4.0 Attribution-ShareAlike