The deep ultraviolet spectroscopic properties of a next-generation photoresist
Aplikace | 2011 | Agilent TechnologiesInstrumentation
UV–VIS Spektrofotometrie
IndustriesMateriálová analýza, Polovodiče
ManufacturerAgilent Technologies
Key wordsphotoresist, deep, reflectance, specular, spectrophotometer, cary, absolute, sra, locations, accessory, mirrors, resist, wafer, spectroscopic, ultraviolet, polyhydroxystyrene, soebekti, polymethacrylates, wavelengths, lithography, coating, photoresists, spectra, lithographic, glovebox, reflectivity, matched, formidable, movable, wavelength, broadband, next, generation, properties, amplified, massachusetts, nitrogen, light, acquired, conventional, five, electromagnetic, limit, absorb, spherical, plans, portions, instruments, theory, calculates
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