Library | LabRulez ICPMS

SmartRinse — Maximizing throughput

Technical notes

| 2010 | Agilent Technologies

ICP/OES

Instrumentation

ICP/OES

Manufacturer

Agilent Technologies

Industries

Using ICP-QQQ for UO2 + product ion measurement to reduce uranium hydride ion interference and enable trace 236U isotopic analysis

Applications

| 2016 | Agilent Technologies

ICP/MS, ICP/MS/MS

Instrumentation

ICP/MS, ICP/MS/MS

Manufacturer

Agilent Technologies

Industries

Environmental, Energy & Chemicals

Trace level analysis of sulfur, phosphorus, silicon and chlorine in NMP using the Agilent 8800 Triple Quadrupole ICP-MS

Applications

| 2013 | Agilent Technologies

ICP/MS, ICP/MS/MS

Instrumentation

ICP/MS, ICP/MS/MS

Manufacturer

Agilent Technologies

Industries

Pharma & Biopharma

WCPS: Analysis of radioactive iodine-129 by ICP-QQQ using MS/MS mode and a new octopole reaction cell with axial acceleratio

Posters

| 2017 | Agilent Technologies

ICP/MS, ICP/MS/MS

Instrumentation

ICP/MS, ICP/MS/MS

Manufacturer

Agilent Technologies

Industries

Environmental, Energy & Chemicals

APWC: Analysis of radioactive iodine-129 by ICP-QQQ using MS/MS mode and an octopole reaction cell with axial acceleration

Posters

| 2017 | Agilent Technologies

ICP/MS, ICP/MS/MS

Instrumentation

ICP/MS, ICP/MS/MS

Manufacturer

Agilent Technologies

Industries

Environmental

Ultra-Trace Analysis of Beryllium in Water and Industrial Hygiene Samples by ICP-MS

Applications

| 2006 | Agilent Technologies

ICP/MS

Instrumentation

ICP/MS

Manufacturer

Agilent Technologies

Industries

Environmental

Ultratrace measurement of calcium in ultrapure water using the Agilent 8800 Triple Quadrupole ICP-MS

Applications

| 2012 | Agilent Technologies

ICP/MS, ICP/MS/MS

Instrumentation

ICP/MS, ICP/MS/MS

Manufacturer

Agilent Technologies

Industries

Semiconductor Analysis

Measuring photometric accuracy using the double aperture method

Applications

| 2011 | Agilent Technologies

UV–VIS spectrophotometry

Instrumentation

UV–VIS spectrophotometry

Manufacturer

Agilent Technologies

Industries

Energy & Chemicals

Characterization of Surface Metal Contamination on Silicon Wafers Using Surface Metal Extraction Inductively Coupled Plasma Mass Spectrometry (SME- ICP-MS)

Applications

| 2001 | Agilent Technologies

ICP/MS

Instrumentation

ICP/MS

Manufacturer

Agilent Technologies

Industries

Semiconductor Analysis

Understanding RoHS

Technical notes

| 2006 | Shimadzu

Instrumentation

Manufacturer

Shimadzu

Industries

Materials Testing

SmartRinse — Maximizing throughput

Using ICP-QQQ for UO2 + product ion measurement to reduce uranium hydride ion interference and enable trace 236U isotopic analysis

Trace level analysis of sulfur, phosphorus, silicon and chlorine in NMP using the Agilent 8800 Triple Quadrupole ICP-MS

WCPS: Analysis of radioactive iodine-129 by ICP-QQQ using MS/MS mode and a new octopole reaction cell with axial acceleratio

APWC: Analysis of radioactive iodine-129 by ICP-QQQ using MS/MS mode and an octopole reaction cell with axial acceleration

Ultra-Trace Analysis of Beryllium in Water and Industrial Hygiene Samples by ICP-MS

Ultratrace measurement of calcium in ultrapure water using the Agilent 8800 Triple Quadrupole ICP-MS

Measuring photometric accuracy using the double aperture method

Characterization of Surface Metal Contamination on Silicon Wafers Using Surface Metal Extraction Inductively Coupled Plasma Mass Spectrometry (SME- ICP-MS)

Understanding RoHS

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