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Improvement of ICP-MS detectability of phosphorus and titanium in high purity silicon samples using the Agilent 8800 Triple Quadrupole ICP-MS
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| 2013 | Agilent Technologies
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Monitoring Heavy Metals by ICP- OES for Compliance with RoHS and WEEE Directives
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| 2010 | Agilent Technologies
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High Throughput Multi-Elemental Profiling of Plant Samples with the 4200 MP-AES
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| 2017 | Agilent Technologies
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| 2015 | Agilent Technologies
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Determination of challenging elements in ultrapure semiconductor grade sulfuric acid by Triple Quadrupole ICP-MS
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| 2015 | Agilent Technologies
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