Analysis of Ultratrace Impurities in High Purity Copper using the Agilent 8900 ICP-QQQ

Applications
| 2018 | Agilent Technologies
ICP/MS, ICP/MS/MS
Instrumentation
ICP/MS, ICP/MS/MS
Manufacturer
Agilent Technologies
Industries
Energy & Chemicals , Semiconductor Analysis

Measuring Inorganic Impurities in Semiconductor Manufacturing

Guides
| 2022 | Agilent Technologies
GC, ICP/MS, Speciation analysis, ICP/MS/MS
Instrumentation
GC, ICP/MS, Speciation analysis, ICP/MS/MS
Manufacturer
Agilent Technologies
Industries
Semiconductor Analysis

Determination of Trace Metal Impurities in Semiconductor Grade Phosphoric Acid by High Sensitivity Reaction Cell ICP-MS

Applications
| 2003 | Agilent Technologies
ICP/MS
Instrumentation
ICP/MS
Manufacturer
Agilent Technologies
Industries
Semiconductor Analysis

Enhanced Helium Collision Mode with Agilent ORS4 Cell

Technical notes
| 2020 | Agilent Technologies
ICP/MS
Instrumentation
ICP/MS
Manufacturer
Agilent Technologies
Industries

Routine determination of ultratrace elements in semiconductor grade nitric acid by the Thermo Scientific iCAP RQ ICP-MS

Applications
| 2017 | Thermo Fisher Scientific
ICP/MS
Instrumentation
ICP/MS
Manufacturer
Thermo Fisher Scientific
Industries
Semiconductor Analysis

Routine determination of trace rare earth elements in high purity Nd2 O3 using the Agilent 8800 ICP-QQQ

Applications
| 2015 | Agilent Technologies
ICP/MS, ICP/MS/MS
Instrumentation
ICP/MS, ICP/MS/MS
Manufacturer
Agilent Technologies
Industries
Environmental

Automated Analysis of Ultratrace Elemental Impurities in Isopropyl Alcohol

Applications
| 2022 | Agilent Technologies
ICP/MS, ICP/MS/MS
Instrumentation
ICP/MS, ICP/MS/MS
Manufacturer
Agilent Technologies
Industries
Semiconductor Analysis

Accurate determination of arsenic and selenium in environmental samples using triple quadrupole ICP-MS

Applications
| 2020 | Thermo Fisher Scientific
ICP/MS, ICP/MS/MS
Instrumentation
ICP/MS, ICP/MS/MS
Manufacturer
Thermo Fisher Scientific
Industries
Environmental

Ultra-low level determination of phosphorus, sulfur, silicon and chlorine using the Agilent 8900 ICP-QQQ

Applications
| 2018 | Agilent Technologies
ICP/MS, ICP/MS/MS
Instrumentation
ICP/MS, ICP/MS/MS
Manufacturer
Agilent Technologies
Industries
Semiconductor Analysis

Analysis of Trace Metal Impurities in High Purity Hydrochloric Acid Using ICP-QQQ

Applications
| 2017 | Agilent Technologies
ICP/MS, ICP/MS/MS
Instrumentation
ICP/MS, ICP/MS/MS
Manufacturer
Agilent Technologies
Industries
Semiconductor Analysis
Other projects
GCMS
LCMS
Follow us
FacebookLinkedInYouTube
More information
WebinarsAbout usContact usTerms of use
LabRulez s.r.o. All rights reserved. Content available under a CC BY-SA 4.0 Attribution-ShareAlike