Determination of Phenolic Antioxidant DBPC and DBP Levels in Electrical Insulating Oil
Applications
| 2015 | Agilent Technologies
FTIR Spectroscopy
Instrumentation
FTIR Spectroscopy
Manufacturer
Agilent Technologies
Industries
Energy & Chemicals
Analysis of Elements in Cement Using ICPE-9820
Applications
| 2015 | Shimadzu
GD/MP/ICP-AES
Instrumentation
GD/MP/ICP-AES
Manufacturer
Shimadzu
Industries
Energy & Chemicals
Measurement of Arsenic and Selenium in White Rice and River Water by Hydride Generation-Atomic Absorption Spectrometry (HG-AAS) with Electric Cell Heating
Applications
| 2015 | Shimadzu
AAS
Instrumentation
AAS
Manufacturer
Shimadzu
Industries
Environmental, Food & Agriculture
Fitted Background Correction (FBC)— fast, accurate and fully-automated background correction
Technical notes
| 2014 | Agilent Technologies
ICP-OES
Instrumentation
ICP-OES
Manufacturer
Agilent Technologies
Industries
Precision Analysis of Toxic Elements in Plastic by ICPE-9800 Series
Applications
| 2014 | Shimadzu
GD/MP/ICP-AES
Instrumentation
GD/MP/ICP-AES
Manufacturer
Shimadzu
Industries
Materials Testing
IDENTIFYING NATURAL GEMS FROM SYNTHETIC AND TREATED COUNTERPARTS USING THE AGILENT CARY 660
Applications
| 2014 | Agilent Technologies
FTIR Spectroscopy
Instrumentation
FTIR Spectroscopy
Manufacturer
Agilent Technologies
Industries
Materials Testing
Carbon and Sulfur Determination in Low Carbon Ferroalloys
Applications
| 2013 | LECO
Elemental Analysis, Thermal Analysis
Instrumentation
Elemental Analysis, Thermal Analysis
Manufacturer
LECO
Industries
Materials Testing
Removal of hydride ion interferences (MH+ ) on Rare Earth Elements using the Agilent 8800 Triple Quadrupole ICP-MS
Applications
| 2012 | Agilent Technologies
ICP/MS, ICP/MS/MS
Instrumentation
ICP/MS, ICP/MS/MS
Manufacturer
Agilent Technologies
Industries
Environmental
Analysis of Herbal Medicines by ICPE-9000
Applications
| 2012 | Shimadzu
GD/MP/ICP-AES
Instrumentation
GD/MP/ICP-AES
Manufacturer
Shimadzu
Industries
Pharma & Biopharma
The deep ultraviolet spectroscopic properties of a next-generation photoresist