Applications - page 11

Dual-Cell System (DCS) and Advanced Helium Mode (AHM)

Technical notes

| 2026 | Agilent Technologies

ICP/MS, ICP/MS/MS

Instrumentation

ICP/MS, ICP/MS/MS

Manufacturer

Agilent Technologies

Industries

Other

Ultra High Matrix Introduction (UHMI)

Technical notes

| 2021 | Agilent Technologies

ICP/MS, ICP/MS/MS

Instrumentation

ICP/MS, ICP/MS/MS

Manufacturer

Agilent Technologies

Industries

Enhanced Helium Collision Mode with Agilent ORS4 Cell

Technical notes

| 2020 | Agilent Technologies

ICP/MS

Instrumentation

ICP/MS

Manufacturer

Agilent Technologies

Industries

CryoEase® Argon service for ICP users

Technical notes

| 2013 | Air Products

Instrumentation

Manufacturer

Air Products

Industries

Agilent ICP-MS Interface Cones

Technical notes

| 2019 | Agilent Technologies

ICP/MS, ICP/MS/MS

Instrumentation

ICP/MS, ICP/MS/MS

Manufacturer

Agilent Technologies

Industries

Basic Performance of the Agilent 7700s ICP-MS for the Analysis of Semiconductor Samples

Technical notes

| 2010 | Agilent Technologies

ICP/MS

Instrumentation

ICP/MS

Manufacturer

Agilent Technologies

Industries

Semiconductor Analysis

‘Fitted’ — Fast, accurate and fully- automated background correction

Technical notes

| 2012 | Agilent Technologies

ICP-OES

Instrumentation

ICP-OES

Manufacturer

Agilent Technologies

Industries

Flexible Sample Introduction with the Multimode Sample Introduction System

Technical notes

| 2019 | Agilent Technologies

ICP-OES

Instrumentation

ICP-OES

Manufacturer

Agilent Technologies

Industries

Fitted Background Correction (FBC)— fast, accurate and fully-automated background correction

Technical notes

| 2014 | Agilent Technologies

ICP-OES

Instrumentation

ICP-OES

Manufacturer

Agilent Technologies

Industries

Benefits of a vertically oriented torch— fast, accurate results, even for your toughest samples

Technical notes

| 2014 | Agilent Technologies

ICP-OES

Instrumentation

ICP-OES

Manufacturer

Agilent Technologies

Industries