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    Improve Data Integrity and Remove Analytical Variables in UV-Vis Measurements

    Applications
    | 2019 | Agilent Technologies
    UV–VIS spectrophotometry
    Instrumentation
    UV–VIS spectrophotometry
    Manufacturer
    Agilent Technologies
    Industries
    Pharma & Biopharma

    ICP-OES Background and Interference Removal

    Technical notes
    | 2020 | Agilent Technologies
    ICP/OES
    Instrumentation
    ICP/OES
    Manufacturer
    Agilent Technologies
    Industries

    ORS4 AND HELIUM MODE FOR MORE EFFECTIVE INTERFERENCE REMOVAL IN COMPLEX SAMPLES

    Others
    | 2015 | Agilent Technologies
    ICP/MS
    Instrumentation
    ICP/MS
    Manufacturer
    Agilent Technologies
    Industries

    ENHANCED HELIUM MODE CELL PERFORMANCE FOR IMPROVED INTERFERENCE REMOVAL IN ICP-MS

    Others
    | 2015 | Agilent Technologies
    ICP/MS
    Instrumentation
    ICP/MS
    Manufacturer
    Agilent Technologies
    Industries

    Unmatched Removal of Spectral Interferences in ICP-MS Using the Agilent Octopole Reaction System with Helium Collision Mode

    Technical notes
    | 2006 | Agilent Technologies
    ICP/MS
    Instrumentation
    ICP/MS
    Manufacturer
    Agilent Technologies
    Industries

    REACTION CELL FRONTIER: REMOVING OXIDE POLYATOMIC ION INTERFERENCES USING AN INNOVATIVE REACTION CELL ICP-MS

    Posters
    | N/A | Agilent Technologies
    ICP/MS, ICP/MS/MS
    Instrumentation
    ICP/MS, ICP/MS/MS
    Manufacturer
    Agilent Technologies
    Industries

    Removal of hydride ion interferences (MH+ ) on Rare Earth Elements using the Agilent 8800 Triple Quadrupole ICP-MS

    Applications
    | 2012 | Agilent Technologies
    ICP/MS, ICP/MS/MS
    Instrumentation
    ICP/MS, ICP/MS/MS
    Manufacturer
    Agilent Technologies
    Industries
    Environmental

    Low Level Measurement of Cadmium in Foods

    Applications
    | 2010 | Agilent Technologies
    AAS
    Instrumentation
    AAS
    Manufacturer
    Agilent Technologies
    Industries
    Food & Agriculture

    WCPS: Efficient Removal of Polyatomic Ions by ICP-MS Equipped with Novel Reaction Cell: Examples of Highly Purified Chemicals Used for Semiconductor

    Posters
    | 2012 | Agilent Technologies
    ICP/MS, ICP/MS/MS
    Instrumentation
    ICP/MS, ICP/MS/MS
    Manufacturer
    Agilent Technologies
    Industries
    Semiconductor Analysis

    Lead isotope analysis: Removal of 204 Hg isobaric interference from 204 Pb using ICP-QQQ in MS/MS mode

    Applications
    | 2014 | Agilent Technologies
    ICP/MS, ICP/MS/MS
    Instrumentation
    ICP/MS, ICP/MS/MS
    Manufacturer
    Agilent Technologies
    Industries
    Environmental
     

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