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    ORS4 AND HELIUM MODE FOR MORE EFFECTIVE INTERFERENCE REMOVAL IN COMPLEX SAMPLES

    Others
    | 2015 | Agilent Technologies
    ICP/MS
    Instrumentation
    ICP/MS
    Manufacturer
    Agilent Technologies
    Industries

    Exploring Four Capabilities that are Defining the Future of ICP-MS

    Others
    | 2018 | Agilent Technologies
    ICP/MS, ICP/MS/MS
    Instrumentation
    ICP/MS, ICP/MS/MS
    Manufacturer
    Agilent Technologies
    Industries

    A New Design of Ion Lens and Collision/Reaction Cell for ICP-MS

    Posters
    | N/A | Agilent Technologies
    ICP/MS
    Instrumentation
    ICP/MS
    Manufacturer
    Agilent Technologies
    Industries

    IMSC: A New Design of Ion Lens and Collision/Reaction Cell for ICP-MS

    Posters
    | 2009 | Agilent Technologies
    ICP/MS
    Instrumentation
    ICP/MS
    Manufacturer
    Agilent Technologies
    Industries

    Technical Overview and Performance Capability of the Agilent 7900s ICP-MS for Semiconductor Applications

    Technical notes
    | 2020 | Agilent Technologies
    ICP/MS
    Instrumentation
    ICP/MS
    Manufacturer
    Agilent Technologies
    Industries
    Semiconductor Analysis

    WCPS: Enhancing Helium Mode Performance to Provide Improved Detection Limits for Difficult Elements Including S, P, Fe, and Se

    Posters
    | 2011 | Agilent Technologies
    ICP/MS
    Instrumentation
    ICP/MS
    Manufacturer
    Agilent Technologies
    Industries
    Food & Agriculture

    Determination of Chloride in Crude Oils using an Agilent 8900 ICP-QQQ

    Applications
    | 2019 | Agilent Technologies
    ICP/MS, ICP/MS/MS
    Instrumentation
    ICP/MS, ICP/MS/MS
    Manufacturer
    Agilent Technologies
    Industries
    Energy & Chemicals

    Determination of Chromium, Selenium, and Molybdenum in Nutritional Products by ICP-MS

    Applications
    | 2015 | Agilent Technologies
    ICP/MS
    Instrumentation
    ICP/MS
    Manufacturer
    Agilent Technologies
    Industries
    Food & Agriculture

    Resolution of 176 Yb and 176 Lu interferences on 176 Hf to enable accurate 176 Hf/177 Hf isotope ratio analysis using ICP-QQQ with MS/MS

    Applications
    | 2017 | Agilent Technologies
    ICP/MS, ICP/MS/MS
    Instrumentation
    ICP/MS, ICP/MS/MS
    Manufacturer
    Agilent Technologies
    Industries
    Environmental

    Analysis of Trace Metal Impurities in High Purity Hydrochloric Acid Using ICP-QQQ

    Applications
    | 2017 | Agilent Technologies
    ICP/MS, ICP/MS/MS
    Instrumentation
    ICP/MS, ICP/MS/MS
    Manufacturer
    Agilent Technologies
    Industries
    Semiconductor Analysis
     

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