Applications | LabRulez ICPMS

Ultrapure Process Chemicals Analysis by ICP-QQQ with Hot Plasma Conditions

Applications

| 2021 | Agilent Technologies

ICP/MS, ICP/MS/MS

Instrumentation

ICP/MS, ICP/MS/MS

Manufacturer

Agilent Technologies

Industries

Semiconductor Analysis

Analysis of Ultratrace Impurities in High Silicon Matrix Samples by ICP-QQQ

Applications

| 2021 | Agilent Technologies

ICP/MS, ICP/MS/MS

Instrumentation

ICP/MS, ICP/MS/MS

Manufacturer

Agilent Technologies

Industries

Semiconductor Analysis

Analysis of Ultratrace Impurities in High Purity Copper using the Agilent 8900 ICP-QQQ

Applications

| 2018 | Agilent Technologies

ICP/MS, ICP/MS/MS

Instrumentation

ICP/MS, ICP/MS/MS

Manufacturer

Agilent Technologies

Industries

Energy & Chemicals , Semiconductor Analysis

Determination of Trace Metal Impurities in Semiconductor Grade Phosphoric Acid by High Sensitivity Reaction Cell ICP-MS

Applications

| 2003 | Agilent Technologies

ICP/MS

Instrumentation

ICP/MS

Manufacturer

Agilent Technologies

Industries

Semiconductor Analysis

Ultra-low level determination of phosphorus, sulfur, silicon and chlorine using the Agilent 8900 ICP-QQQ

Applications

| 2018 | Agilent Technologies

ICP/MS, ICP/MS/MS

Instrumentation

ICP/MS, ICP/MS/MS

Manufacturer

Agilent Technologies

Industries

Semiconductor Analysis

Removal of hydride ion interferences (MH+ ) on Rare Earth Elements using the Agilent 8800 Triple Quadrupole ICP-MS

Applications

| 2012 | Agilent Technologies

ICP/MS, ICP/MS/MS

Instrumentation

ICP/MS, ICP/MS/MS

Manufacturer

Agilent Technologies

Industries

Environmental

Ultra trace measurement of potassium and other elements in ultrapure water using the Agilent 8800 ICP-QQQ in cool plasma reaction cell mode

Applications

| 2014 | Agilent Technologies

ICP/MS, ICP/MS/MS

Instrumentation

ICP/MS, ICP/MS/MS

Manufacturer

Agilent Technologies

Industries

Semiconductor Analysis

Using ICP-QQQ for UO2 + product ion measurement to reduce uranium hydride ion interference and enable trace 236U isotopic analysis

Applications

| 2016 | Agilent Technologies

ICP/MS, ICP/MS/MS

Instrumentation

ICP/MS, ICP/MS/MS

Manufacturer

Agilent Technologies

Industries

Environmental, Energy & Chemicals

The Measurement of High Optical Densities in the Near-Infrared

Applications

| 2022 | Agilent Technologies

NIR Spectroscopy

Instrumentation

NIR Spectroscopy

Manufacturer

Agilent Technologies

Industries

Materials Testing

Characterization of Surface Metal Contamination on Silicon Wafers Using Surface Metal Extraction Inductively Coupled Plasma Mass Spectrometry (SME- ICP-MS)

Applications

| 2001 | Agilent Technologies

ICP/MS

Instrumentation

ICP/MS

Manufacturer

Agilent Technologies

Industries

Semiconductor Analysis

Applications | LabRulez ICPMS

Ultrapure Process Chemicals Analysis by ICP-QQQ with Hot Plasma Conditions

Analysis of Ultratrace Impurities in High Silicon Matrix Samples by ICP-QQQ

Analysis of Ultratrace Impurities in High Purity Copper using the Agilent 8900 ICP-QQQ

Determination of Trace Metal Impurities in Semiconductor Grade Phosphoric Acid by High Sensitivity Reaction Cell ICP-MS

Ultra-low level determination of phosphorus, sulfur, silicon and chlorine using the Agilent 8900 ICP-QQQ

Removal of hydride ion interferences (MH+ ) on Rare Earth Elements using the Agilent 8800 Triple Quadrupole ICP-MS

Ultra trace measurement of potassium and other elements in ultrapure water using the Agilent 8800 ICP-QQQ in cool plasma reaction cell mode

Using ICP-QQQ for UO2 + product ion measurement to reduce uranium hydride ion interference and enable trace 236U isotopic analysis

The Measurement of High Optical Densities in the Near-Infrared

Characterization of Surface Metal Contamination on Silicon Wafers Using Surface Metal Extraction Inductively Coupled Plasma Mass Spectrometry (SME- ICP-MS)

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