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US EPA Method 8260 with the Tekmar Atomx XYZ P&T System and Agilent 7890B GC/5977A MS
Applications
| 2018 | Agilent Technologies
GC/MSD, Purge and Trap, GC/SQ
Instrumentation
GC/MSD, Purge and Trap, GC/SQ
Manufacturer
Agilent Technologies, Tekmar Teledyne
Industries
Environmental
US EPA Method 524.3 with the Tekmar Lumin P & T Concentrator and Agilent 7890B GC and 5977A MSD System
Applications
| 2017 | Tekmar Teledyne
GC/MSD, Purge and Trap, GC/SQ
Instrumentation
GC/MSD, Purge and Trap, GC/SQ
Manufacturer
Agilent Technologies, Tekmar Teledyne
Industries
Environmental
Meeting the Korean Method ES 04607.1 for Naphthalene (나프탈렌) with Static and Dynamic Headspace GC/MS
Applications
| 2016 | Tekmar Teledyne
GC/MSD, HeadSpace, GC/SQ
Instrumentation
GC/MSD, HeadSpace, GC/SQ
Manufacturer
Agilent Technologies, Tekmar Teledyne
Industries
Environmental
US EPA Method 524.4 with the Tekmar Lumin P & T Concentrator and Agilent 7890B GC and 5977A MSD System
Applications
| 2018 | Tekmar Teledyne
GC/MSD, Purge and Trap, GC/SQ
Instrumentation
GC/MSD, Purge and Trap, GC/SQ
Manufacturer
Agilent Technologies, Tekmar Teledyne
Industries
Environmental
US EPA Method 524.2 with the Teledyne Tekmar Lumin P&T Concentrator and Agilent 7890B GC / 5977A MS
Applications
| 2016 | Tekmar Teledyne
GC/MSD, Purge and Trap, GC/SQ
Instrumentation
GC/MSD, Purge and Trap, GC/SQ
Manufacturer
Agilent Technologies, Tekmar Teledyne
Industries
Environmental
US EPA Method 624 with the Tekmar Lumin and the Agilent 7890B GC/5977A MS
Applications
| 2018 | Agilent Technologies
GC/MSD, Purge and Trap, GC/SQ
Instrumentation
GC/MSD, Purge and Trap, GC/SQ
Manufacturer
Agilent Technologies, Tekmar Teledyne
Industries
Environmental
Meeting the Korean Method ES 04601.2 for 1,4- Dioxane (1,4-다이옥산-헤드스페이스/기체크로마토그래피- 질량분석법) with Static Headspace GC/MS
Applications
| 2016 | Tekmar Teledyne
GC/MSD, HeadSpace, GC/SQ
Instrumentation
GC/MSD, HeadSpace, GC/SQ
Manufacturer
Agilent Technologies, Tekmar Teledyne
Industries
Environmental
Meeting the Korean Method ES 04602.1b for Vinyl Chloride, Acrylonitrile, and Bromoform (염화비닐, 아크릴로니트릴, 브로모포름) with Static and Dynamic Headspace GC/MS
Applications
| 2016 | Tekmar Teledyne
GC/MSD, HeadSpace, GC/SQ
Instrumentation
GC/MSD, HeadSpace, GC/SQ
Manufacturer
Agilent Technologies, Tekmar Teledyne
Industries
Environmental
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LabRulez s.r.o. All rights reserved. Content available under a CC BY-SA 4.0 Attribution-ShareAlike