Applications from Agilent Technologies | LabRulez ICPMS
SmartRinse — Maximizing throughput
Technical notes
| 2010 | Agilent Technologies
ICP/OES
Instrumentation
ICP/OES
Manufacturer
Agilent Technologies
Industries
Using ICP-QQQ for UO2 + product ion measurement to reduce uranium hydride ion interference and enable trace 236U isotopic analysis
Applications
| 2016 | Agilent Technologies
ICP/MS, ICP/MS/MS
Instrumentation
ICP/MS, ICP/MS/MS
Manufacturer
Agilent Technologies
Industries
Environmental, Energy & Chemicals
Trace level analysis of sulfur, phosphorus, silicon and chlorine in NMP using the Agilent 8800 Triple Quadrupole ICP-MS
Applications
| 2013 | Agilent Technologies
ICP/MS, ICP/MS/MS
Instrumentation
ICP/MS, ICP/MS/MS
Manufacturer
Agilent Technologies
Industries
Pharma & Biopharma
WCPS: Analysis of radioactive iodine-129 by ICP-QQQ using MS/MS mode and a new octopole reaction cell with axial acceleratio
Posters
| 2017 | Agilent Technologies
ICP/MS, ICP/MS/MS
Instrumentation
ICP/MS, ICP/MS/MS
Manufacturer
Agilent Technologies
Industries
Environmental, Energy & Chemicals
APWC: Analysis of radioactive iodine-129 by ICP-QQQ using MS/MS mode and an octopole reaction cell with axial acceleration
Posters
| 2017 | Agilent Technologies
ICP/MS, ICP/MS/MS
Instrumentation
ICP/MS, ICP/MS/MS
Manufacturer
Agilent Technologies
Industries
Environmental
Ultra-Trace Analysis of Beryllium in Water and Industrial Hygiene Samples by ICP-MS
Applications
| 2006 | Agilent Technologies
ICP/MS
Instrumentation
ICP/MS
Manufacturer
Agilent Technologies
Industries
Environmental
Measuring photometric accuracy using the double aperture method
Applications
| 2011 | Agilent Technologies
UV–VIS spectrophotometry
Instrumentation
UV–VIS spectrophotometry
Manufacturer
Agilent Technologies
Industries
Energy & Chemicals
Ultratrace measurement of calcium in ultrapure water using the Agilent 8800 Triple Quadrupole ICP-MS
Applications
| 2012 | Agilent Technologies
ICP/MS, ICP/MS/MS
Instrumentation
ICP/MS, ICP/MS/MS
Manufacturer
Agilent Technologies
Industries
Semiconductor Analysis
Characterization of Surface Metal Contamination on Silicon Wafers Using Surface Metal Extraction Inductively Coupled Plasma Mass Spectrometry (SME- ICP-MS)
Applications
| 2001 | Agilent Technologies
ICP/MS
Instrumentation
ICP/MS
Manufacturer
Agilent Technologies
Industries
Semiconductor Analysis
Screening for Sensitive Explosives with Agilent Resolve - a Handheld SORS System