Applications from Agilent Technologies | LabRulez ICPMS
APWC: Interference-free Measurement of Trace Mercury in Tungsten-rich Cosmetic Sample using ICP-QQQ
Posters
| 2017 | Agilent Technologies
ICP/MS, ICP/MS/MS
Instrumentation
ICP/MS, ICP/MS/MS
Manufacturer
Agilent Technologies
Industries
Others
REACTION CELL FRONTIER: REMOVING OXIDE POLYATOMIC ION INTERFERENCES USING AN INNOVATIVE REACTION CELL ICP-MS
Posters
| N/A | Agilent Technologies
ICP/MS, ICP/MS/MS
Instrumentation
ICP/MS, ICP/MS/MS
Manufacturer
Agilent Technologies
Industries
Unmatched Removal of Spectral Interferences in ICP-MS Using the Agilent Octopole Reaction System with Helium Collision Mode
Technical notes
| 2006 | Agilent Technologies
ICP/MS
Instrumentation
ICP/MS
Manufacturer
Agilent Technologies
Industries
Direct measurement of trace rare earth elements (REEs) in high-purity REE oxide using the Agilent 8800 Triple Quadrupole ICP-MS with MS/MS mode
Applications
| 2012 | Agilent Technologies
ICP/MS, ICP/MS/MS
Instrumentation
ICP/MS, ICP/MS/MS
Manufacturer
Agilent Technologies
Industries
Materials Testing
Removal of hydride ion interferences (MH+ ) on Rare Earth Elements using the Agilent 8800 Triple Quadrupole ICP-MS
Applications
| 2012 | Agilent Technologies
ICP/MS, ICP/MS/MS
Instrumentation
ICP/MS, ICP/MS/MS
Manufacturer
Agilent Technologies
Industries
Environmental
Ultratrace Analysis of Solar (Photovoltaic) Grade Bulk Silicon by ICP-MS
Applications
| 2008 | Agilent Technologies
ICP/MS
Instrumentation
ICP/MS
Manufacturer
Agilent Technologies
Industries
Semiconductor Analysis
APWC: Investigation of ICP-MS/MS using oxygen or hydrogen as a reaction gas for interference-free analysis of phosphorus in organic solvents
Posters
| 2017 | Agilent Technologies
ICP/MS, ICP/MS/MS
Instrumentation
ICP/MS, ICP/MS/MS
Manufacturer
Agilent Technologies
Industries
Energy & Chemicals
Evaluation of Deuterium and Zeeman Background Correction with the Presence of Spectral Interferences Determinations of Arsenic in an Aluminium Matrix and Selenium in an Iron Matrix by GFAAS
Technical notes
| 1995 | Agilent Technologies
AAS
Instrumentation
AAS
Manufacturer
Agilent Technologies
Industries
WCPS: Ultratrace Analysis of Phosphorus, Boron and Other Impurities in Photovoltaic Silicon and Trichlorosilane by ICP-MS with High Energy Collision Cell
Posters
| 2011 | Agilent Technologies
ICP/MS
Instrumentation
ICP/MS
Manufacturer
Agilent Technologies
Industries
Semiconductor Analysis
Lead isotope analysis: Removal of 204 Hg isobaric interference from 204 Pb using ICP-QQQ in MS/MS mode