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Applications from Agilent Technologies | LabRulez ICPMS
Agilent ICP-MS Journal (April 2018. Issue 72)
Others
| 2018 | Agilent Technologies
ICP/MS, ICP/MS/MS
Instrumentation
ICP/MS, ICP/MS/MS
Manufacturer
Agilent Technologies
Industries
Food & Agriculture, Semiconductor Analysis
Measuring the UV protection factor (UPF) of fabrics and clothing
Applications
| 2011 | Agilent Technologies
UV–VIS spectrophotometry
Instrumentation
UV–VIS spectrophotometry
Manufacturer
Agilent Technologies
Industries
Materials Testing
Analysis of 50 nm Silica Nanoparticles in Semiconductor Process Chemicals by spICP-MS/MS
Applications
| 2023 | Agilent Technologies
ICP/MS, ICP/MS/MS
Instrumentation
ICP/MS, ICP/MS/MS
Manufacturer
Agilent Technologies
Industries
Semiconductor Analysis
Direct Analysis of Trace Metal Impurities in High Purity Nitric Acid Using ICP-QQQ
Applications
| 2018 | Agilent Technologies
ICP/MS, ICP/MS/MS
Instrumentation
ICP/MS, ICP/MS/MS
Manufacturer
Agilent Technologies
Industries
Semiconductor Analysis
Agilent Atomic Spectroscopy Solutions for the Semiconductor Industry
Guides
| 2020 | Agilent Technologies
ICP/MS, ICP/OES, AAS, ICP/MS/MS, MP/ICP-AES
Instrumentation
ICP/MS, ICP/OES, AAS, ICP/MS/MS, MP/ICP-AES
Manufacturer
Agilent Technologies
Industries
Semiconductor Analysis
Automated Surface Analysis of Metal Contaminants in Silicon Wafers by Online VPD-ICP-MS/MS
Applications
| 2023 | Agilent Technologies
ICP/MS, ICP/MS/MS
Instrumentation
ICP/MS, ICP/MS/MS
Manufacturer
Agilent Technologies
Industries
Semiconductor Analysis
Ultrapure Process Chemicals Analysis by ICP-QQQ with Hot Plasma Conditions
Applications
| 2021 | Agilent Technologies
ICP/MS, ICP/MS/MS
Instrumentation
ICP/MS, ICP/MS/MS
Manufacturer
Agilent Technologies
Industries
Semiconductor Analysis
Determination of Ultratrace Impurities in Semiconductor Photoresist Using ICP-MS/MS
Applications
| 2023 | Agilent Technologies
ICP/MS, ICP/MS/MS
Instrumentation
ICP/MS, ICP/MS/MS
Manufacturer
Agilent Technologies
Industries
Semiconductor Analysis
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LabRulez s.r.o. All rights reserved. Content available under a CC BY-SA 4.0 Attribution-ShareAlike