Applications focused on ICP/MS/MS - page 1

Agilent 8900 Triple Quadrupole ICP-MS (LEAVE INTERFERENCES BEHIND WITH MS/MS)

Others

| 2025 | Agilent Technologies

ICP/MS, ICP/MS/MS

Instrumentation

ICP/MS, ICP/MS/MS

Manufacturer

Agilent Technologies

Industries

Other

Accurate analysis of neptunium 237 in a uranium matrix, using ICP-QQQ with MS/MS

Applications

| 2017 | Agilent Technologies

ICP/MS, ICP/MS/MS

Instrumentation

ICP/MS, ICP/MS/MS

Manufacturer

Agilent Technologies

Industries

Environmental, Energy & Chemicals

A novel ICP-MS/MS approach for the analysis of vanadium in glucose magnesium sulfate injection to meet the requirement of USP<232>/<233>

Posters

| 2019 | Agilent Technologies (ASMS)

ICP/MS, ICP/MS/MS

Instrumentation

ICP/MS, ICP/MS/MS

Manufacturer

Agilent Technologies

Industries

Pharma & Biopharma

Using ICP-MS/MS with M-Lens for the analysis of high silicon matrix samples

Posters

| 2020 | Agilent Technologies (ASMS)

ICP/MS, ICP/MS/MS

Instrumentation

ICP/MS, ICP/MS/MS

Manufacturer

Agilent Technologies

Industries

Semiconductor Analysis

Agilent ICP-MS Journal (January 2019. Issue 75)

Others

| 2019 | Agilent Technologies

ICP/MS, ICP/MS/MS

Instrumentation

ICP/MS, ICP/MS/MS

Manufacturer

Agilent Technologies

Industries

Environmental

Determination of trace elements in ultrapure semiconductor grade sulfuric acid using the Agilent 8900 ICP-QQQ in MS/MS mode

Applications

| 2018 | Agilent Technologies

ICP/MS, ICP/MS/MS

Instrumentation

ICP/MS, ICP/MS/MS

Manufacturer

Agilent Technologies

Industries

Semiconductor Analysis

AGILENT 8900 TRIPLE QUADRUPOLE ICP-MS - LEAVE INTERFERENCES BEHIND WITH MS/MS

Posters

| 2016 | Agilent Technologies

ICP/MS, ICP/MS/MS

Instrumentation

ICP/MS, ICP/MS/MS

Manufacturer

Agilent Technologies

Industries

Agilent 8900 Triple Quadrupole ICP-MS brochure

Brochures and specifications

| 2024 | Agilent Technologies

ICP/MS, ICP/MS/MS

Instrumentation

ICP/MS, ICP/MS/MS

Manufacturer

Agilent Technologies

Industries

Other

Lead isotope analysis: Removal of 204 Hg isobaric interference from 204 Pb using ICP-QQQ in MS/MS mode

Applications

| 2014 | Agilent Technologies

ICP/MS, ICP/MS/MS

Instrumentation

ICP/MS, ICP/MS/MS

Manufacturer

Agilent Technologies

Industries

Environmental

Leave Interferences Behind With MS/MS

Brochures and specifications

| 2025 | Agilent Technologies

ICP/MS, ICP/MS/MS

Instrumentation

ICP/MS, ICP/MS/MS

Manufacturer

Agilent Technologies

Industries