Using ICP-QQQ for UO2 + product ion measurement to reduce uranium hydride ion interference and enable trace 236U isotopic analysis
Applications
| 2016 | Agilent Technologies
ICP/MS, ICP/MS/MS
Instrumentation
ICP/MS, ICP/MS/MS
Manufacturer
Agilent Technologies
Industries
Environmental, Energy & Chemicals
Analysis of 50 nm Silica Nanoparticles in Semiconductor Process Chemicals by spICP-MS/MS
Applications
| 2023 | Agilent Technologies
ICP/MS, ICP/MS/MS
Instrumentation
ICP/MS, ICP/MS/MS
Manufacturer
Agilent Technologies
Industries
Semiconductor Analysis
Characterization of Surface Metal Contamination on Silicon Wafers Using Surface Metal Extraction Inductively Coupled Plasma Mass Spectrometry (SME- ICP-MS)
Applications
| 2001 | Agilent Technologies
ICP/MS
Instrumentation
ICP/MS
Manufacturer
Agilent Technologies
Industries
Semiconductor Analysis
Automated Analysis of Low-to-High Matrix Environmental Samples Using a Single ICP-MS Method
Applications
| 2024 | Agilent Technologies
ICP/MS
Instrumentation
ICP/MS
Manufacturer
Agilent Technologies
Industries
Environmental
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