Applications focused on ICP/MS | LabRulez ICPMS

Characterization of Surface Metal Contamination on Silicon Wafers Using Surface Metal Extraction Inductively Coupled Plasma Mass Spectrometry (SME- ICP-MS)

Applications

| 2001 | Agilent Technologies

ICP/MS

Instrumentation

ICP/MS

Manufacturer

Agilent Technologies

Industries

Semiconductor Analysis

Characterization of Trace Impurities in Silicon Wafers by High Sensitivity Reaction Cell ICP-MS

Applications

| 2003 | Agilent Technologies

ICP/MS

Instrumentation

ICP/MS

Manufacturer

Agilent Technologies

Industries

Semiconductor Analysis

Determination of Trace Metal Impurities in Semiconductor Grade Phosphoric Acid by High Sensitivity Reaction Cell ICP-MS

Applications

| 2003 | Agilent Technologies

ICP/MS

Instrumentation

ICP/MS

Manufacturer

Agilent Technologies

Industries

Semiconductor Analysis

Investigations into the use of helium collision mode and aerosol dilution for ultra-trace analysis of metals in mineral reference materials

Applications

| 2013 | Agilent Technologies

ICP/MS

Instrumentation

ICP/MS

Manufacturer

Agilent Technologies

Industries

Environmental

RoHS/ELV Directives - Measurement of Heavy Metals Using ICP-MS

Applications

| 2006 | Agilent Technologies

ICP/MS

Instrumentation

ICP/MS

Manufacturer

Agilent Technologies

Industries

Environmental

Agilent 7900 ICP-MS simplifies drinking water analysis

Applications

| 2014 | Agilent Technologies

ICP/MS

Instrumentation

ICP/MS

Manufacturer

Agilent Technologies

Industries

Environmental

Automated Analysis of Low-to-High Matrix Environmental Samples Using a Single ICP-MS Method

Applications

| 2024 | Agilent Technologies

ICP/MS

Instrumentation

ICP/MS

Manufacturer

Agilent Technologies

Industries

Environmental

Ultra-Trace ICP-MS Analysis of Metals in Mineral Reference Materials

Applications

| 2021 | Agilent Technologies

ICP/MS

Instrumentation

ICP/MS

Manufacturer

Agilent Technologies

Industries

Environmental

The ultratrace determination of iodine 129 using the Agilent 8800 Triple Quadrupole ICP-MS in MS/MS mode

Applications

| 2012 | Agilent Technologies

ICP/MS, ICP/MS/MS

Instrumentation

ICP/MS, ICP/MS/MS

Manufacturer

Agilent Technologies

Industries

Energy & Chemicals

Automated Analysis of Ultratrace Elemental Impurities in Isopropyl Alcohol

Applications

| 2022 | Agilent Technologies

ICP/MS, ICP/MS/MS

Instrumentation

ICP/MS, ICP/MS/MS

Manufacturer

Agilent Technologies

Industries

Semiconductor Analysis

Applications focused on ICP/MS | LabRulez ICPMS

Characterization of Surface Metal Contamination on Silicon Wafers Using Surface Metal Extraction Inductively Coupled Plasma Mass Spectrometry (SME- ICP-MS)

Characterization of Trace Impurities in Silicon Wafers by High Sensitivity Reaction Cell ICP-MS

Determination of Trace Metal Impurities in Semiconductor Grade Phosphoric Acid by High Sensitivity Reaction Cell ICP-MS

Investigations into the use of helium collision mode and aerosol dilution for ultra-trace analysis of metals in mineral reference materials

RoHS/ELV Directives - Measurement of Heavy Metals Using ICP-MS

Agilent 7900 ICP-MS simplifies drinking water analysis

Automated Analysis of Low-to-High Matrix Environmental Samples Using a Single ICP-MS Method

Ultra-Trace ICP-MS Analysis of Metals in Mineral Reference Materials

The ultratrace determination of iodine 129 using the Agilent 8800 Triple Quadrupole ICP-MS in MS/MS mode

Automated Analysis of Ultratrace Elemental Impurities in Isopropyl Alcohol

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