Comprehensive Analysis of Oligomeric Impurities, Monomer Composition, and End-Group Information in ArFPhotoresist Block Copolymers Using Q-TOF High-Resolution Mass Spectrometry
Posters
| 2025 | Agilent Technologies (ASMS)
LC/MS, LC/MS/MS, LC/TOF, LC/HRMS
Instrumentation
LC/MS, LC/MS/MS, LC/TOF, LC/HRMS
Manufacturer
Agilent Technologies
Industries
Semiconductor Analysis