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Applications from the field of Semiconductor Analysis - page 7
Sub-ppb detection limits for hydride gas contaminants using GC-ICP-QQQ
Applications
| 2015 | Agilent Technologies
GC, Speciation analysis, ICP/MS/MS
Instrumentation
GC, Speciation analysis, ICP/MS/MS
Manufacturer
Agilent Technologies
Industries
Energy & Chemicals , Semiconductor Analysis
Characterization of Trace Impurities in Silicon Wafers by High Sensitivity Reaction Cell ICP-MS
Applications
| 2003 | Agilent Technologies
ICP/MS
Instrumentation
ICP/MS
Manufacturer
Agilent Technologies
Industries
Semiconductor Analysis
Coated Wafer Mapping Using UV-Vis Spectral Reflection and Transmission Measurements
Applications
| 2020 | Agilent Technologies
NIR Spectroscopy, UV–VIS spectrophotometry
Instrumentation
NIR Spectroscopy, UV–VIS spectrophotometry
Manufacturer
Agilent Technologies
Industries
Materials Testing, Semiconductor Analysis
Determination of trace elements in ultrapure semiconductor grade sulfuric acid using the Agilent 8900 ICP-QQQ in MS/MS mode
Applications
| 2018 | Agilent Technologies
ICP/MS, ICP/MS/MS
Instrumentation
ICP/MS, ICP/MS/MS
Manufacturer
Agilent Technologies
Industries
Semiconductor Analysis
Determination of challenging elements in ultrapure semiconductor grade sulfuric acid by Triple Quadrupole ICP-MS
Applications
| 2015 | Agilent Technologies
ICP/MS, ICP/MS/MS
Instrumentation
ICP/MS, ICP/MS/MS
Manufacturer
Agilent Technologies
Industries
Semiconductor Analysis
Analysis of silicon, phosphorus and sulfur in 20% methanol using the Agilent 8800 Triple Quadrupole ICP-MS
Applications
| 2012 | Agilent Technologies
ICP/MS, ICP/MS/MS
Instrumentation
ICP/MS, ICP/MS/MS
Manufacturer
Agilent Technologies
Industries
Energy & Chemicals , Semiconductor Analysis
Determination of Trace Impurities in Electronic Grade Arsine by GC-ICP-QQQ
Applications
| 2020 | Agilent Technologies
GC, ICP/MS, Speciation analysis, ICP/MS/MS
Instrumentation
GC, ICP/MS, Speciation analysis, ICP/MS/MS
Manufacturer
Agilent Technologies
Industries
Semiconductor Analysis
Characterization of Surface Metal Contamination on Silicon Wafers Using Surface Metal Extraction Inductively Coupled Plasma Mass Spectrometry (SME- ICP-MS)
Applications
| 2001 | Agilent Technologies
ICP/MS
Instrumentation
ICP/MS
Manufacturer
Agilent Technologies
Industries
Semiconductor Analysis
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