Applications from the field of Semiconductor Analysis - page 6
Quality control of semiconductor acid baths as per ASTM E1655 – Time- and cost-efficient with NIRS
Technical notes
| 2021 | Metrohm
NIR Spectroscopy
Instrumentation
NIR Spectroscopy
Manufacturer
Metrohm
Industries
Semiconductor Analysis
Direct Measurement of Metallic Impurities in 20% Ammonium Hydroxide by 7700s/7900 ICP-MS
Applications
| 2017 | Agilent Technologies
ICP/MS
Instrumentation
ICP/MS
Manufacturer
Agilent Technologies
Industries
Semiconductor Analysis
Direct Analysis of Photoresist and Related Solvents Using the Agilent 7500cs ICP-MS
Applications
| 2004 | Agilent Technologies
ICP/MS
Instrumentation
ICP/MS
Manufacturer
Agilent Technologies
Industries
Semiconductor Analysis
The deep ultraviolet spectroscopic properties of a next-generation photoresist
Applications
| 2011 | Agilent Technologies
UV–VIS spectrophotometry
Instrumentation
UV–VIS spectrophotometry
Manufacturer
Agilent Technologies
Industries
Materials Testing, Semiconductor Analysis
Characterization of Surface Metal Contamination on Silicon Wafers Using Surface Metal Extraction Inductively Coupled Plasma Mass Spectrometry (SME- ICP-MS)
Applications
| 2001 | Agilent Technologies
ICP/MS
Instrumentation
ICP/MS
Manufacturer
Agilent Technologies
Industries
Semiconductor Analysis
Analysis of semiconductor grade mineral acids
Applications
| 2018 | Thermo Fisher Scientific
ICP/MS
Instrumentation
ICP/MS
Manufacturer
Thermo Fisher Scientific
Industries
Semiconductor Analysis
Ultra-low level determination of phosphorus, sulfur, silicon and chlorine using the Agilent 8900 ICP-QQQ
Applications
| 2018 | Agilent Technologies
ICP/MS, ICP/MS/MS
Instrumentation
ICP/MS, ICP/MS/MS
Manufacturer
Agilent Technologies
Industries
Semiconductor Analysis
Routine determination of ultratrace elements in semiconductor grade nitric acid by the Thermo Scientific iCAP RQ ICP-MS
Applications
| 2017 | Thermo Fisher Scientific
ICP/MS
Instrumentation
ICP/MS
Manufacturer
Thermo Fisher Scientific
Industries
Semiconductor Analysis
Characterization of Trace Impurities in Silicon Wafers by High Sensitivity Reaction Cell ICP-MS
Applications
| 2003 | Agilent Technologies
ICP/MS
Instrumentation
ICP/MS
Manufacturer
Agilent Technologies
Industries
Semiconductor Analysis
Analysis of 50 nm Silica Nanoparticles in Semiconductor Process Chemicals by spICP-MS/MS