Ultrapure Process Chemicals Analysis by ICP-QQQ with Hot Plasma Conditions
Applications
| 2021 | Agilent Technologies
ICP/MS, ICP/MS/MS
Instrumentation
ICP/MS, ICP/MS/MS
Manufacturer
Agilent Technologies
Industries
Semiconductor Analysis
Direct Measurement of Metallic Impurities in 20% Ammonium Hydroxide by 7700s/7900 ICP-MS
Applications
| 2017 | Agilent Technologies
ICP/MS
Instrumentation
ICP/MS
Manufacturer
Agilent Technologies
Industries
Semiconductor Analysis
Sub-ppb detection limits for hydride gas contaminants using GC-ICP-QQQ
Applications
| 2015 | Agilent Technologies
GC, Speciation analysis, ICP/MS/MS
Instrumentation
GC, Speciation analysis, ICP/MS/MS
Manufacturer
Agilent Technologies
Industries
Energy & Chemicals , Semiconductor Analysis
Characterization of Surface Metal Contamination on Silicon Wafers Using Surface Metal Extraction Inductively Coupled Plasma Mass Spectrometry (SME- ICP-MS)
Applications
| 2001 | Agilent Technologies
ICP/MS
Instrumentation
ICP/MS
Manufacturer
Agilent Technologies
Industries
Semiconductor Analysis
Analysis of Electrolyte and Electrode in LIB Degraded by Overcharge and High Temperature
Applications
| 2026 | Shimadzu
GD/MP/ICP-AES, GC/MSD, X-ray, GC/SQ
Instrumentation
GD/MP/ICP-AES, GC/MSD, X-ray, GC/SQ
Manufacturer
Shimadzu
Industries
Semiconductor Analysis
Analysis of Ultratrace Impurities in High Purity Copper using the Agilent 8900 ICP-QQQ